描述
ANALYTICAL EQUIPMENT Process Type: FA SEMs/TEMs/Dual Beams配置
1. Operating system: Win XP 2002, SP3 2. User interface: FEI xT 3.8.10, 10-1-2013 3. SEM SFEG 4. FIB Sidewinder (21nA) 5. GIS Traditional: Traditional: Pt, SCM, IEE and Omni GIS Carbon deposit 6. Detectors ETD, CDM, TLD 7. Additional items: Autoprobe 200, XEI Evactron, ThermoCube chiller 8. Main OEM PC, Support PC (contains Omni GIS software as well as Autoprobe SW)OEM 代工型號說明
The Helios NanoLab 400 is a DualBeam system that integrates both ion and electron beams for Focused Ion Beam (FIB) and Scanning Electron Microscopy (SEM) functionality in one machine. This allows users to switch between the two beams for quick and accurate navigation and milling. The convergence of the SEM and FIB at a short working distance enables precision “slice-and-view” cross-sectioning and analysis at high resolution. This system provides a powerful tool for sample preparation and analysis.文檔
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THERMOFISHER SCIENTIFIC / FEI / PHILLIPS
HELIOS NANOLAB 400
已驗證
類別
SEM / FIB
上次驗證: 超過60天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
43516
晶圓尺寸:
未知
年份:
2008
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
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THERMOFISHER SCIENTIFIC / FEI / PHILLIPS
HELIOS NANOLAB 400
類別
SEM / FIB
上次驗證: 超過60天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
43516
晶圓尺寸:
未知
年份:
2008
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
描述
ANALYTICAL EQUIPMENT Process Type: FA SEMs/TEMs/Dual Beams配置
1. Operating system: Win XP 2002, SP3 2. User interface: FEI xT 3.8.10, 10-1-2013 3. SEM SFEG 4. FIB Sidewinder (21nA) 5. GIS Traditional: Traditional: Pt, SCM, IEE and Omni GIS Carbon deposit 6. Detectors ETD, CDM, TLD 7. Additional items: Autoprobe 200, XEI Evactron, ThermoCube chiller 8. Main OEM PC, Support PC (contains Omni GIS software as well as Autoprobe SW)OEM 代工型號說明
The Helios NanoLab 400 is a DualBeam system that integrates both ion and electron beams for Focused Ion Beam (FIB) and Scanning Electron Microscopy (SEM) functionality in one machine. This allows users to switch between the two beams for quick and accurate navigation and milling. The convergence of the SEM and FIB at a short working distance enables precision “slice-and-view” cross-sectioning and analysis at high resolution. This system provides a powerful tool for sample preparation and analysis.文檔
無文檔