描述
FEI FIB 800 Focused Ion Beam (FIB) System Does not include GIS Missing molecular pump And the controller.配置
Configuration: ISA Interface Joystick Oil pump Hard Disk Drive (HDD) I-Gun: Type: Prelens column Beam current: 1 pA - 11 nA Vacuum types: Mechanical pump Ion getter pump Stage type: Motor stage for XL50, 8" Type: Load lock Detector: CDEM Operating system: MS Windows NTOEM 代工型號說明
The FEI FIB 800 is a state-of-the-art Focused Ion Beam (FIB) system that is utilized for a variety of applications, including circuit editing, defect and failure analysis, TEM lamella preparation, nanofabrication, nanoprototyping, and MEMS. It employs a Magnum ion column and boasts a milling power of 21nA beam current. The system can accommodate samples with diameters up to 200mm and features a 5-axis motorized eucentric tilt stage. Additionally, it includes a gas injection system with up to four injectors and a vacuum system with column IGP, air-cooled Turbo, and mechanical PVP.文檔
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THERMOFISHER SCIENTIFIC / FEI / PHILLIPS
FIB 800
已驗證
類別
SEM / FIB
上次驗證: 超過60天前
關鍵商品詳情
條件:
Used
作業狀態:
Deinstalled
產品編號:
106614
晶圓尺寸:
8"/200mm
年份:
1996
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
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THERMOFISHER SCIENTIFIC / FEI / PHILLIPS
FIB 800
類別
SEM / FIB
上次驗證: 超過60天前
關鍵商品詳情
條件:
Used
作業狀態:
Deinstalled
產品編號:
106614
晶圓尺寸:
8"/200mm
年份:
1996
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
描述
FEI FIB 800 Focused Ion Beam (FIB) System Does not include GIS Missing molecular pump And the controller.配置
Configuration: ISA Interface Joystick Oil pump Hard Disk Drive (HDD) I-Gun: Type: Prelens column Beam current: 1 pA - 11 nA Vacuum types: Mechanical pump Ion getter pump Stage type: Motor stage for XL50, 8" Type: Load lock Detector: CDEM Operating system: MS Windows NTOEM 代工型號說明
The FEI FIB 800 is a state-of-the-art Focused Ion Beam (FIB) system that is utilized for a variety of applications, including circuit editing, defect and failure analysis, TEM lamella preparation, nanofabrication, nanoprototyping, and MEMS. It employs a Magnum ion column and boasts a milling power of 21nA beam current. The system can accommodate samples with diameters up to 200mm and features a 5-axis motorized eucentric tilt stage. Additionally, it includes a gas injection system with up to four injectors and a vacuum system with column IGP, air-cooled Turbo, and mechanical PVP.文檔
無文檔