描述
Tool will be configured for manual mask loading 5” 6” or 7” Optics magnifications M0 to M4 available Scanner Module Includes Stage Optics Light Source Lamp housing Camera Focus Laser Interferometer Mask handling assemblies IP Module: Detector Boards Database Express Data Express module: Pre Station配置
無配置OEM 代工型號說明
ARIS-i™ is an advanced reticle inspection system that uses Ultraviolet (UV) wavelengths to automatically inspect reticles used in device generations of 180 nm and below. It features dual image processing channels, a high-quality CCD camera, and a high-speed computing architecture to provide the highest throughput for handling advanced RET technologies such as PSM and OPC with sensitivity down to 150 nm. The system also includes a Data Express™ module for fast data conversion and rendering for die-to-database inspection, as well as a Line Width Error Detector (LWED) for detecting local and regional linewidth variations. With fast inspection setup, high reliability, and availability, ARIS-i™ is the tool of choice for mask makers and semiconductor manufacturers looking for the lowest cost of ownership.文檔
無文檔
類別
Reticle / Mask Inspection
上次驗證: 16 天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
140567
晶圓尺寸:
未知
年份:
2000
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
APPLIED MATERIALS (AMAT)
ARIS-i
類別
Reticle / Mask Inspection
上次驗證: 16 天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
140567
晶圓尺寸:
未知
年份:
2000
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
描述
Tool will be configured for manual mask loading 5” 6” or 7” Optics magnifications M0 to M4 available Scanner Module Includes Stage Optics Light Source Lamp housing Camera Focus Laser Interferometer Mask handling assemblies IP Module: Detector Boards Database Express Data Express module: Pre Station配置
無配置OEM 代工型號說明
ARIS-i™ is an advanced reticle inspection system that uses Ultraviolet (UV) wavelengths to automatically inspect reticles used in device generations of 180 nm and below. It features dual image processing channels, a high-quality CCD camera, and a high-speed computing architecture to provide the highest throughput for handling advanced RET technologies such as PSM and OPC with sensitivity down to 150 nm. The system also includes a Data Express™ module for fast data conversion and rendering for die-to-database inspection, as well as a Line Width Error Detector (LWED) for detecting local and regional linewidth variations. With fast inspection setup, high reliability, and availability, ARIS-i™ is the tool of choice for mask makers and semiconductor manufacturers looking for the lowest cost of ownership.文檔
無文檔