概述

ARIS-i™ is an advanced reticle inspection system that uses Ultraviolet (UV) wavelengths to automatically inspect reticles used in device generations of 180 nm and below. It features dual image processing channels, a high-quality CCD camera, and a high-speed computing architecture to provide the highest throughput for handling advanced RET technologies such as PSM and OPC with sensitivity down to 150 nm. The system also includes a Data Express™ module for fast data conversion and rendering for die-to-database inspection, as well as a Line Width Error Detector (LWED) for detecting local and regional linewidth variations. With fast inspection setup, high reliability, and availability, ARIS-i™ is the tool of choice for mask makers and semiconductor manufacturers looking for the lowest cost of ownership.