描述
The Clusterline 200 systems offeredis equipped with 5 single process chambers each. They were used only for reactive sputtering of SiO2 layers on 150mm blank Si wafers. Both systems are still in a clean room and in working conditions. Further devices mounted on these tools are: two vacuum loadports each, wafer aligners, buffer stations for upto 5 wafers, OCR back side readers. Handler Type MX800. 5x Pulsed DC chambers with RF on Chuck配置
無配置OEM 代工型號說明
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類別
PVD / Sputtering
上次驗證: 超過30天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
136261
晶圓尺寸:
6"/150mm
年份:
2000
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
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EVATEC / UNAXIS / OERLIKON / BALZERS
CLUSTERLINE 200
類別
PVD / Sputtering
上次驗證: 超過30天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
136261
晶圓尺寸:
6"/150mm
年份:
2000
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
描述
The Clusterline 200 systems offeredis equipped with 5 single process chambers each. They were used only for reactive sputtering of SiO2 layers on 150mm blank Si wafers. Both systems are still in a clean room and in working conditions. Further devices mounted on these tools are: two vacuum loadports each, wafer aligners, buffer stations for upto 5 wafers, OCR back side readers. Handler Type MX800. 5x Pulsed DC chambers with RF on Chuck配置
無配置OEM 代工型號說明
未提供文檔
無文檔