描述
AMAT ENDURA2 CH2 - ALD TiN, CH3 - ALD TiN,CH5 - ALD TiN (3x Chamber breakout) Asset Description Applied Endura Centinel ALD TiN Software Version: NA CIM: NA Process: ALD TiN配置
x3 Chambers Hardware Configuration System Type Description Quantity Handler System NA Options System stand-alone ALD TiN chambers 3 Main System NONE Factory Interface NONE Others Excluded Items List (Pumps, Chillers & Abatement are all excluded) NONEOEM 代工型號說明
The Applied Materials ENDURA II is a highly advanced platform used in the semiconductor industry for physical vapor deposition (PVD) processes. It is designed to deposit thin films of various materials onto semiconductor wafers with exceptional precision and uniformity.文檔
無文檔
類別
PVD / Sputtering
上次驗證: 5 天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
136521
晶圓尺寸:
12"/300mm
年份:
2014
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
類似上架商品
查看全部
APPLIED MATERIALS (AMAT)
ENDURA II
類別
PVD / Sputtering
上次驗證: 5 天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
136521
晶圓尺寸:
12"/300mm
年份:
2014
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
描述
AMAT ENDURA2 CH2 - ALD TiN, CH3 - ALD TiN,CH5 - ALD TiN (3x Chamber breakout) Asset Description Applied Endura Centinel ALD TiN Software Version: NA CIM: NA Process: ALD TiN配置
x3 Chambers Hardware Configuration System Type Description Quantity Handler System NA Options System stand-alone ALD TiN chambers 3 Main System NONE Factory Interface NONE Others Excluded Items List (Pumps, Chillers & Abatement are all excluded) NONEOEM 代工型號說明
The Applied Materials ENDURA II is a highly advanced platform used in the semiconductor industry for physical vapor deposition (PVD) processes. It is designed to deposit thin films of various materials onto semiconductor wafers with exceptional precision and uniformity.文檔
無文檔