描述
AMAT ENDURA2 CVD TAN ALD Asset Description: Process chamber Software Version: 2.8274 toolsoftware CIM: n/a Process: Tantal ALD ( CVD)配置
Hardware Configuration System Type Description Quantity Others n/a Handler System n/a Options System n/a Factory Interface FOUP Main System Endura 2 chamber 1 Excluded Items List (Pumps, Chillers & Abatement are all excluded) NONEOEM 代工型號說明
The Applied Materials ENDURA II is a highly advanced platform used in the semiconductor industry for physical vapor deposition (PVD) processes. It is designed to deposit thin films of various materials onto semiconductor wafers with exceptional precision and uniformity.文檔
無文檔
類別
PVD / Sputtering
上次驗證: 5 天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
136322
晶圓尺寸:
12"/300mm
年份:
2017
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
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APPLIED MATERIALS (AMAT)
ENDURA II
類別
PVD / Sputtering
上次驗證: 5 天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
136322
晶圓尺寸:
12"/300mm
年份:
2017
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
描述
AMAT ENDURA2 CVD TAN ALD Asset Description: Process chamber Software Version: 2.8274 toolsoftware CIM: n/a Process: Tantal ALD ( CVD)配置
Hardware Configuration System Type Description Quantity Others n/a Handler System n/a Options System n/a Factory Interface FOUP Main System Endura 2 chamber 1 Excluded Items List (Pumps, Chillers & Abatement are all excluded) NONEOEM 代工型號說明
The Applied Materials ENDURA II is a highly advanced platform used in the semiconductor industry for physical vapor deposition (PVD) processes. It is designed to deposit thin films of various materials onto semiconductor wafers with exceptional precision and uniformity.文檔
無文檔