描述
Mostly used for NPI products配置
-Configured with 5 sputter heads -Configured for DC sputtering -Was used to deposit Cu, Au, Ti, Co, Ni, Pd, Pt, Ir, and Sn -Used with argon gas -Base pressure was 2 * 10^-7 Torr -No substrate heater -Substrate size is configured for 1” diameter wafers, but this can be changed as needed. The deposition platen is approximately 7” in diameter -Cathode target diameter is 3” -Included 3 DC power supplies and 1 RF supplyOEM 代工型號說明
未提供文檔
無文檔
類別
PVD / Sputtering
上次驗證: 7 天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
143004
晶圓尺寸:
未知
年份:
2011
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
AJA INTERNATIONAL, INC
ATC-ORION 8
類別
PVD / Sputtering
上次驗證: 7 天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
143004
晶圓尺寸:
未知
年份:
2011
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
描述
Mostly used for NPI products配置
-Configured with 5 sputter heads -Configured for DC sputtering -Was used to deposit Cu, Au, Ti, Co, Ni, Pd, Pt, Ir, and Sn -Used with argon gas -Base pressure was 2 * 10^-7 Torr -No substrate heater -Substrate size is configured for 1” diameter wafers, but this can be changed as needed. The deposition platen is approximately 7” in diameter -Cathode target diameter is 3” -Included 3 DC power supplies and 1 RF supplyOEM 代工型號說明
未提供文檔
無文檔