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LAM RESEARCH / NOVELLUS CONCEPT ONE "C1"
    描述
    無描述
    配置
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    OEM 代工型號說明
    The Novellus Concept-One is a PECVD tool that uses plasma-enhanced chemical vapor deposition to deposit various dielectric films on silicon wafers. It can deposit oxide, nitride, oxynitride, PSG and TEOS oxide films. The Concept1 is also a PECVD tool that deposits dielectric films on 6" wafers. It is capable of depositing thick films in excess of 1 um and allows CMOS compatible metals, making it suitable for backend processes. The system deposits on multiple wafers in parallel in a batch-type reactor.
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    類別
    PECVD

    上次驗證: 超過60天前

    關鍵商品詳情

    條件:

    Refurbished


    作業狀態:

    未知


    產品編號:

    121166


    晶圓尺寸:

    未知


    年份:

    未知


    Logistics Support
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
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    LAM RESEARCH / NOVELLUS

    CONCEPT ONE "C1"

    verified-listing-icon
    已驗證
    類別
    PECVD
    上次驗證: 超過60天前
    listing-photo-1465e4a92a904998b2babd92034d60cc-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/32199/1465e4a92a904998b2babd92034d60cc/5a8d727190234c95ab3eddd584320e8d_39a95058594d4dcd8396c573fed86a2d_mw.jpeg
    listing-photo-1465e4a92a904998b2babd92034d60cc-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/32199/1465e4a92a904998b2babd92034d60cc/f14b79ee8875444ba9fd11d545b7b51e_30ef0c23cb8d43eaa85b95924e59fb8d_mw.jpeg
    listing-photo-1465e4a92a904998b2babd92034d60cc-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/32199/1465e4a92a904998b2babd92034d60cc/8abf98d0db8549848772aa2be66777d1_83d4262aaa04494586b5e9704f711512_mw.jpeg
    listing-photo-1465e4a92a904998b2babd92034d60cc-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/32199/1465e4a92a904998b2babd92034d60cc/5e272218fe69434d9a8ac707afd43fd6_9689889a0d8f4f248f82db10691b0a07_mw.jpeg
    關鍵商品詳情

    條件:

    Refurbished


    作業狀態:

    未知


    產品編號:

    121166


    晶圓尺寸:

    未知


    年份:

    未知


    Logistics Support
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    描述
    無描述
    配置
    無配置
    OEM 代工型號說明
    The Novellus Concept-One is a PECVD tool that uses plasma-enhanced chemical vapor deposition to deposit various dielectric films on silicon wafers. It can deposit oxide, nitride, oxynitride, PSG and TEOS oxide films. The Concept1 is also a PECVD tool that deposits dielectric films on 6" wafers. It is capable of depositing thick films in excess of 1 um and allows CMOS compatible metals, making it suitable for backend processes. The system deposits on multiple wafers in parallel in a batch-type reactor.
    文檔

    無文檔

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    查看全部