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APPLIED MATERIALS (AMAT) PRODUCER GT3 APFE
    描述
    Platform RTP Equipment Producer GT3 Pyra Anneal
    配置
    · Factory Interface o 2 stationary robots o Pre-aligner o 2 N2 loadports o Standard pass-thru · Reduced Pressure Mainframe o 4 cooling station loadlocks (QWLL) with N2 purge o Dual blade robot · Anneals Twin Chamber with In Situ Clean o Dual zone heaters o RPS quartz liners o Chamber quartz liners o Chamber uniformity liners o Shower head o Lift pins o RPS clean (1 RPS per twin chamber) · Chamber Gas Panel o Z700 MFCs o Pressure regulators o Block valves o POC filter · Additional Items o Water cooled QWLL o Heated exhaust lines o Additional N2 Load Port o Additional gas stick o Mainframe O2 analyzer
    OEM 代工型號說明
    The Applied Producer GT is a fast and cost-effective 300mm CVD platform that can process 180 wafers per hour. It has twice the throughput density of any competitive system and provides complete process transparency for PECVD applications for 45nm and beyond. The system incorporates several new components to maximize wafer handling efficiency, including a FX robot that can transfer 4 wafers simultaneously, wafer handling components that minimize defects, and a double-decker loadlock. The platform also has a high-capacity factory interface and integrated metrology capability. Additionally, the Producer GT is designed to improve serviceability, reducing preventative maintenance time by 25%. To deliver unmatched productivity, the system incorporates several new components aimed at maximizing the system’s wafer handling efficiency and eliminating all wafer transport bottlenecks. Its FX robot allows simultaneous transfer of 4 wafers, enabling higher productivity for a 3-twin chamber configuration. Wafer handling components, designed to minimize defects, achieve 30% lower mechanical-based particle performance while maintaining high productivity. The platform’s double-decker loadlock reduces wafer handling time and increases chamber utilization. A high-capacity factory interface supports up to 4 FOUPs for operational efficiency and integrated metrology capability. The Producer GT has also been designed to improve platform serviceability, reducing preventative maintenance time by 25%.
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    已驗證

    類別
    PECVD

    上次驗證: 7 天前

    關鍵商品詳情

    條件:

    Used


    作業狀態:

    未知


    產品編號:

    135055


    晶圓尺寸:

    12"/300mm


    年份:

    未知


    Logistics Support
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    類似上架商品
    查看全部
    APPLIED MATERIALS (AMAT) PRODUCER GT3 APFE

    APPLIED MATERIALS (AMAT)

    PRODUCER GT3 APFE

    PECVD
    年份: 0條件: 二手
    上次驗證7 天前

    APPLIED MATERIALS (AMAT)

    PRODUCER GT3 APFE

    verified-listing-icon
    已驗證
    類別
    PECVD
    上次驗證: 7 天前
    listing-photo-4e656a01509945e293d4624c0cce6a51-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
    關鍵商品詳情

    條件:

    Used


    作業狀態:

    未知


    產品編號:

    135055


    晶圓尺寸:

    12"/300mm


    年份:

    未知


    Logistics Support
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    描述
    Platform RTP Equipment Producer GT3 Pyra Anneal
    配置
    · Factory Interface o 2 stationary robots o Pre-aligner o 2 N2 loadports o Standard pass-thru · Reduced Pressure Mainframe o 4 cooling station loadlocks (QWLL) with N2 purge o Dual blade robot · Anneals Twin Chamber with In Situ Clean o Dual zone heaters o RPS quartz liners o Chamber quartz liners o Chamber uniformity liners o Shower head o Lift pins o RPS clean (1 RPS per twin chamber) · Chamber Gas Panel o Z700 MFCs o Pressure regulators o Block valves o POC filter · Additional Items o Water cooled QWLL o Heated exhaust lines o Additional N2 Load Port o Additional gas stick o Mainframe O2 analyzer
    OEM 代工型號說明
    The Applied Producer GT is a fast and cost-effective 300mm CVD platform that can process 180 wafers per hour. It has twice the throughput density of any competitive system and provides complete process transparency for PECVD applications for 45nm and beyond. The system incorporates several new components to maximize wafer handling efficiency, including a FX robot that can transfer 4 wafers simultaneously, wafer handling components that minimize defects, and a double-decker loadlock. The platform also has a high-capacity factory interface and integrated metrology capability. Additionally, the Producer GT is designed to improve serviceability, reducing preventative maintenance time by 25%. To deliver unmatched productivity, the system incorporates several new components aimed at maximizing the system’s wafer handling efficiency and eliminating all wafer transport bottlenecks. Its FX robot allows simultaneous transfer of 4 wafers, enabling higher productivity for a 3-twin chamber configuration. Wafer handling components, designed to minimize defects, achieve 30% lower mechanical-based particle performance while maintaining high productivity. The platform’s double-decker loadlock reduces wafer handling time and increases chamber utilization. A high-capacity factory interface supports up to 4 FOUPs for operational efficiency and integrated metrology capability. The Producer GT has also been designed to improve platform serviceability, reducing preventative maintenance time by 25%.
    文檔

    無文檔

    類似上架商品
    查看全部
    APPLIED MATERIALS (AMAT) PRODUCER GT3 APFE

    APPLIED MATERIALS (AMAT)

    PRODUCER GT3 APFE

    PECVD年份: 0條件: 二手上次驗證:7 天前
    APPLIED MATERIALS (AMAT) PRODUCER GT3 APFE

    APPLIED MATERIALS (AMAT)

    PRODUCER GT3 APFE

    PECVD年份: 0條件: 二手上次驗證:7 天前
    APPLIED MATERIALS (AMAT) PRODUCER GT3 APFE

    APPLIED MATERIALS (AMAT)

    PRODUCER GT3 APFE

    PECVD年份: 0條件: 二手上次驗證:7 天前