概述

The Applied Producer GT is a fast and cost-effective 300mm CVD platform that can process 180 wafers per hour. It has twice the throughput density of any competitive system and provides complete process transparency for PECVD applications for 45nm and beyond. The system incorporates several new components to maximize wafer handling efficiency, including a FX robot that can transfer 4 wafers simultaneously, wafer handling components that minimize defects, and a double-decker loadlock. The platform also has a high-capacity factory interface and integrated metrology capability. Additionally, the Producer GT is designed to improve serviceability, reducing preventative maintenance time by 25%. To deliver unmatched productivity, the system incorporates several new components aimed at maximizing the system’s wafer handling efficiency and eliminating all wafer transport bottlenecks. Its FX robot allows simultaneous transfer of 4 wafers, enabling higher productivity for a 3-twin chamber configuration. Wafer handling components, designed to minimize defects, achieve 30% lower mechanical-based particle performance while maintaining high productivity. The platform’s double-decker loadlock reduces wafer handling time and increases chamber utilization. A high-capacity factory interface supports up to 4 FOUPs for operational efficiency and integrated metrology capability. The Producer GT has also been designed to improve platform serviceability, reducing preventative maintenance time by 25%.