描述
Installed and running Equipment status: Operational. This machine GaN process. It can be used for both 4-inch and 6-inch wafers (previously used for 4-inch and now producing 6-inch). Only additional purchases of replacement hot plates and related accessories are required.配置
Previously, the GaN growth was on 4-inch wafers, now it's on 6-inch wafers, all in six pieces. Schematic and circuit data for the equipment. Equipment: Photos of the reaction chamber (upper, inside, and below), and gas source piping with equipment door open. Human-machine interface software version: EpiTT_TWO. PLC, SLC, and RF generator details.OEM 代工型號說明
The AIXTRON AIX 2800 G4 is an advanced metal-organic chemical vapor deposition (MOCVD) system developed by AIXTRON SE. This cutting-edge system is specifically designed for epitaxial growth of compound semiconductor materials, with a primary focus on producing high-performance optoelectronic devices like light-emitting diodes (LEDs) and laser diodes. Its precise and controlled growth process enables the creation of high-quality semiconductor layers, making it a crucial tool for manufacturing optoelectronic components used in various applications, including lighting, displays, telecommunications, and other high-performance electronic devices.文檔
AIXTRON
AIX 2800 G4
已驗證
類別
MOCVD
上次驗證: 2 天前
關鍵商品詳情
條件:
Used
作業狀態:
Installed / Running
產品編號:
100029
晶圓尺寸:
6"/150mm
年份:
2008
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
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AIX 2800 G4
類別
MOCVD
上次驗證: 2 天前
關鍵商品詳情
條件:
Used
作業狀態:
Installed / Running
產品編號:
100029
晶圓尺寸:
6"/150mm
年份:
2008
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available