描述
AIX 2800 G4 RaN EPI MOCVD Reactor配置
無配置OEM 代工型號說明
The AIXTRON AIX 2800 G4 is an advanced metal-organic chemical vapor deposition (MOCVD) system developed by AIXTRON SE. This cutting-edge system is specifically designed for epitaxial growth of compound semiconductor materials, with a primary focus on producing high-performance optoelectronic devices like light-emitting diodes (LEDs) and laser diodes. Its precise and controlled growth process enables the creation of high-quality semiconductor layers, making it a crucial tool for manufacturing optoelectronic components used in various applications, including lighting, displays, telecommunications, and other high-performance electronic devices.文檔
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AIXTRON
AIX 2800 G4
已驗證
類別
MOCVD
上次驗證: 超過60天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
97761
晶圓尺寸:
未知
年份:
未知
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
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AIXTRON
AIX 2800 G4
類別
MOCVD
上次驗證: 超過60天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
97761
晶圓尺寸:
未知
年份:
未知
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
描述
AIX 2800 G4 RaN EPI MOCVD Reactor配置
無配置OEM 代工型號說明
The AIXTRON AIX 2800 G4 is an advanced metal-organic chemical vapor deposition (MOCVD) system developed by AIXTRON SE. This cutting-edge system is specifically designed for epitaxial growth of compound semiconductor materials, with a primary focus on producing high-performance optoelectronic devices like light-emitting diodes (LEDs) and laser diodes. Its precise and controlled growth process enables the creation of high-quality semiconductor layers, making it a crucial tool for manufacturing optoelectronic components used in various applications, including lighting, displays, telecommunications, and other high-performance electronic devices.文檔
無文檔