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KLA QUANTOX XP
  • KLA QUANTOX XP
  • KLA QUANTOX XP
  • KLA QUANTOX XP
描述
無描述
配置
(QTX-300)-Surface Charge Measurement
OEM 代工型號說明
Quantox XP is an in-line, real-time electrical monitoring and characterization tool that enables advanced gate formation for sub-130 nm devices. It provides better than 95% correlation to device electrical test data and allows non-contact electrical test measurements of key transistor gate parameters. ACTIV technology features highly accurate, comprehensive data on physical and electrical properties of advanced gate dielectric materials. Quantox XP offers a complete gate monitoring solution for today’s advanced gate dielectric processes. It also provides comprehensive films metrology control using optical and electrical topography measurements.
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已驗證

類別
Metrology

上次驗證: 超過60天前

關鍵商品詳情

條件:

Used


作業狀態:

未知


產品編號:

107340


晶圓尺寸:

12"/300mm


年份:

2010


Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available

KLA

QUANTOX XP

verified-listing-icon
已驗證
類別
Metrology
上次驗證: 超過60天前
listing-photo-879bf8d9e0fc46c0a1a4e93ae0e2ca5e-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
關鍵商品詳情

條件:

Used


作業狀態:

未知


產品編號:

107340


晶圓尺寸:

12"/300mm


年份:

2010


Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
描述
無描述
配置
(QTX-300)-Surface Charge Measurement
OEM 代工型號說明
Quantox XP is an in-line, real-time electrical monitoring and characterization tool that enables advanced gate formation for sub-130 nm devices. It provides better than 95% correlation to device electrical test data and allows non-contact electrical test measurements of key transistor gate parameters. ACTIV technology features highly accurate, comprehensive data on physical and electrical properties of advanced gate dielectric materials. Quantox XP offers a complete gate monitoring solution for today’s advanced gate dielectric processes. It also provides comprehensive films metrology control using optical and electrical topography measurements.
文檔

無文檔