描述
process 1ch配置
IA_MidCurOEM 代工型號說明
SEN CORPORATION / SUMITOMO NV-MC3 is a high-performance medium current ion implantation system that is suitable for 300 mm to 150 mm wafers. It is designed to achieve the highest implantation quality in the world, with an implantation energy range of 5 keV to 750 keV. The system minimizes metal and energy contamination, and reduces implantation angle deviation and beam shape change through the use of a left-right symmetric beam line. It also improves uniformity by reducing beam divergence and fixing the implant position with a unique scanning method. The NV-MC3 supports heavy ion implantation as standard, and is highly reliable and maintainable.文檔
無文檔
類別
Medium Current
上次驗證: 12 天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
144785
晶圓尺寸:
12"/300mm
年份:
2024
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
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SEN CORPORATION / SUMITOMO
NV MC3
類別
Medium Current
上次驗證: 12 天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
144785
晶圓尺寸:
12"/300mm
年份:
2024
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
描述
process 1ch配置
IA_MidCurOEM 代工型號說明
SEN CORPORATION / SUMITOMO NV-MC3 is a high-performance medium current ion implantation system that is suitable for 300 mm to 150 mm wafers. It is designed to achieve the highest implantation quality in the world, with an implantation energy range of 5 keV to 750 keV. The system minimizes metal and energy contamination, and reduces implantation angle deviation and beam shape change through the use of a left-right symmetric beam line. It also improves uniformity by reducing beam divergence and fixing the implant position with a unique scanning method. The NV-MC3 supports heavy ion implantation as standard, and is highly reliable and maintainable.文檔
無文檔