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SEN CORPORATION / SUMITOMO NV MC3
  • SEN CORPORATION / SUMITOMO NV MC3
  • SEN CORPORATION / SUMITOMO NV MC3
  • SEN CORPORATION / SUMITOMO NV MC3
描述
無描述
配置
無配置
OEM 代工型號說明
SEN CORPORATION / SUMITOMO NV-MC3 is a high-performance medium current ion implantation system that is suitable for 300 mm to 150 mm wafers. It is designed to achieve the highest implantation quality in the world, with an implantation energy range of 5 keV to 750 keV. The system minimizes metal and energy contamination, and reduces implantation angle deviation and beam shape change through the use of a left-right symmetric beam line. It also improves uniformity by reducing beam divergence and fixing the implant position with a unique scanning method. The NV-MC3 supports heavy ion implantation as standard, and is highly reliable and maintainable.
文檔

無文檔

類別
Medium Current

上次驗證: 超過60天前

關鍵商品詳情

條件:

Used


作業狀態:

未知


產品編號:

119327


晶圓尺寸:

8"/200mm


年份:

2001


Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available

SEN CORPORATION / SUMITOMO

NV MC3

verified-listing-icon
已驗證
類別
Medium Current
上次驗證: 超過60天前
listing-photo-a0d98fd93f3b4c808fbffc3d4be2021b-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
關鍵商品詳情

條件:

Used


作業狀態:

未知


產品編號:

119327


晶圓尺寸:

8"/200mm


年份:

2001


Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
描述
無描述
配置
無配置
OEM 代工型號說明
SEN CORPORATION / SUMITOMO NV-MC3 is a high-performance medium current ion implantation system that is suitable for 300 mm to 150 mm wafers. It is designed to achieve the highest implantation quality in the world, with an implantation energy range of 5 keV to 750 keV. The system minimizes metal and energy contamination, and reduces implantation angle deviation and beam shape change through the use of a left-right symmetric beam line. It also improves uniformity by reducing beam divergence and fixing the implant position with a unique scanning method. The NV-MC3 supports heavy ion implantation as standard, and is highly reliable and maintainable.
文檔

無文檔