描述
Electron-beam lithography system配置
Known issues: Distorted imaging Control board issue Minimum feature size: 20 nm Beam energy: 100 eV – 30 keV Thermal field emission source Laser-interferometer controlled stage with 2 nm precision Small pieces up to 100 mm wafers Load lock for faster sample loading Laser height sensing for focus correctionOEM 代工型號說明
he Raith e-LiNE is an electron beam lithography tool which utilizes thermal field emission filament technology and a laser-interferometer controlled stage. The system is equipped with a load lock, an automatic height laser sensor, and both In-lens and SE2 detectors.文檔
無文檔
RAITH
e-LiNE
類別
Lithography
上次驗證: 9 天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
153432
晶圓尺寸:
未知
年份:
未知
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
描述
Electron-beam lithography system配置
Known issues: Distorted imaging Control board issue Minimum feature size: 20 nm Beam energy: 100 eV – 30 keV Thermal field emission source Laser-interferometer controlled stage with 2 nm precision Small pieces up to 100 mm wafers Load lock for faster sample loading Laser height sensing for focus correctionOEM 代工型號說明
he Raith e-LiNE is an electron beam lithography tool which utilizes thermal field emission filament technology and a laser-interferometer controlled stage. The system is equipped with a load lock, an automatic height laser sensor, and both In-lens and SE2 detectors.文檔
無文檔