描述
無描述配置
Compressor: CTI X 4EA Chamber Cryo Pump: CT-8 Source Dry Pump: Edward Beamline Dry Pump: Varian Diffusion L/L Rough Pump: EdwardOEM 代工型號說明
The Varian 160XP is a high current ion implanter used in semiconductor manufacturing. It was manufactured by Varian in 1991 and operates on a voltage of 208 volts with a phase of 3+1. It is part of the XP series of ion implant systems by Varian.文檔
無文檔
APPLIED MATERIALS (AMAT) / VARIAN
160XP
已驗證
類別
High Current
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
24736
晶圓尺寸:
未知
年份:
1991
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Logistics Support
Available
Money Back Guarantee
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Transaction Insured by Moov
Available
Refurbishment Services
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APPLIED MATERIALS (AMAT) / VARIAN
160XP
已驗證
類別
High Current
上次驗證: 超過60天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
24736
晶圓尺寸:
未知
年份:
1991
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
描述
無描述配置
Compressor: CTI X 4EA Chamber Cryo Pump: CT-8 Source Dry Pump: Edward Beamline Dry Pump: Varian Diffusion L/L Rough Pump: EdwardOEM 代工型號說明
The Varian 160XP is a high current ion implanter used in semiconductor manufacturing. It was manufactured by Varian in 1991 and operates on a voltage of 208 volts with a phase of 3+1. It is part of the XP series of ion implant systems by Varian.文檔
無文檔