描述
無描述配置
IBA_HiCurOEM 代工型號說明
The Applied Quantum X Implant system, along with Applied's other technologies, meets the strict requirements for 65nm transistors. It offers high throughput at low energies, uniformity across all points and wafers, and precise motion control to prevent particle damage. The system is extendible to new applications for advanced logic and memory devices. Quantum X redefines fab productivity for high current ion implantation by providing single-wafer precision, ultra-low defect levels, and high throughput. Its innovative technology enables extendibility to high tilt implant and other new applications at 65nm and beyond. It features high throughput at low energies (200eV - 80keV) with all points, all wafers uniformity and two-dimensional parallel scanning with StepScan™ fixed beam technology for single wafer processing and up to 60° tilt angle文檔
無文檔
類別
High Current
上次驗證: 9 天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
144809
晶圓尺寸:
12"/300mm
年份:
2006
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
APPLIED MATERIALS (AMAT)
QUANTUM X
類別
High Current
上次驗證: 9 天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
144809
晶圓尺寸:
12"/300mm
年份:
2006
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
描述
無描述配置
IBA_HiCurOEM 代工型號說明
The Applied Quantum X Implant system, along with Applied's other technologies, meets the strict requirements for 65nm transistors. It offers high throughput at low energies, uniformity across all points and wafers, and precise motion control to prevent particle damage. The system is extendible to new applications for advanced logic and memory devices. Quantum X redefines fab productivity for high current ion implantation by providing single-wafer precision, ultra-low defect levels, and high throughput. Its innovative technology enables extendibility to high tilt implant and other new applications at 65nm and beyond. It features high throughput at low energies (200eV - 80keV) with all points, all wafers uniformity and two-dimensional parallel scanning with StepScan™ fixed beam technology for single wafer processing and up to 60° tilt angle文檔
無文檔