概述

The Applied Quantum X Implant system, along with Applied's other technologies, meets the strict requirements for 65nm transistors. It offers high throughput at low energies, uniformity across all points and wafers, and precise motion control to prevent particle damage. The system is extendible to new applications for advanced logic and memory devices. Quantum X redefines fab productivity for high current ion implantation by providing single-wafer precision, ultra-low defect levels, and high throughput. Its innovative technology enables extendibility to high tilt implant and other new applications at 65nm and beyond. It features high throughput at low energies (200eV - 80keV) with all points, all wafers uniformity and two-dimensional parallel scanning with StepScan™ fixed beam technology for single wafer processing and up to 60° tilt angle