描述
無描述配置
-Poly Furnace (Zro HiK process) -300 mm Production with Max production 100Pcs -2 IO Port ,18 Carrier Stock -Waves System CTL , Temp CTL M560 -Heater Type : VMU series , -Fork Transfer with 4+1 -2 Boat -Gas :N2,SiH4, AsH3/H2OEM 代工型號說明
TELINDY PLUS™ is a cutting-edge thermal processing technology that combines the best features of the TELFORMULA™ minibatch system and the previous generation TELINDY™ platform. It offers improved process performance and productivity, with new enhancements such as improved maintenance access, dry gas chamber cleaning, and low O2 environment loading area control. These features contribute to yield increases by managing small particles more effectively. The highest levels of productivity are achieved by combining a 125 wafer load size with TEL’s FTPS™ responsive heater and a dual boat system option. TELINDY PLUS™ can be used for a wide range of applications, from traditional silicon treatments to leading edge ALD processes and radical oxidation. It represents the convergence of demonstrated experience and advanced technology, making it a powerful tool for thermal processing.文檔
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TEL / TOKYO ELECTRON
TELINDY PLUS
已驗證
類別
Furnaces / Diffusion
上次驗證: 超過60天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
65729
晶圓尺寸:
12"/300mm
年份:
2009
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
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TEL / TOKYO ELECTRON
TELINDY PLUS
類別
Furnaces / Diffusion
上次驗證: 超過60天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
65729
晶圓尺寸:
12"/300mm
年份:
2009
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
描述
無描述配置
-Poly Furnace (Zro HiK process) -300 mm Production with Max production 100Pcs -2 IO Port ,18 Carrier Stock -Waves System CTL , Temp CTL M560 -Heater Type : VMU series , -Fork Transfer with 4+1 -2 Boat -Gas :N2,SiH4, AsH3/H2OEM 代工型號說明
TELINDY PLUS™ is a cutting-edge thermal processing technology that combines the best features of the TELFORMULA™ minibatch system and the previous generation TELINDY™ platform. It offers improved process performance and productivity, with new enhancements such as improved maintenance access, dry gas chamber cleaning, and low O2 environment loading area control. These features contribute to yield increases by managing small particles more effectively. The highest levels of productivity are achieved by combining a 125 wafer load size with TEL’s FTPS™ responsive heater and a dual boat system option. TELINDY PLUS™ can be used for a wide range of applications, from traditional silicon treatments to leading edge ALD processes and radical oxidation. It represents the convergence of demonstrated experience and advanced technology, making it a powerful tool for thermal processing.文檔
無文檔