描述
MISSING PARTS: (1 set) Quarts wares - Process tube, etc. Equipment Status: Out of Fab Software OS: TEL Waves Type: Diffusion Air Valve: FUJIKIN MFC, MFM: HORIBA STEC Three phase power: 3Ø AC 208V Single phase power: 1Ø AC 120V APC: CKD GAS: PN2 / N2 / 0.1%PH3 / SiH4 / He / ClF3配置
The furnace sub-system includes the following major components: - Automation system - Heater - Process chamber - Temperature controller - Scavenger - Cooling water unit The gas sub-system includes the following major components: - Gas supply unit - Exhaust - Vacuum line ( for LPCVD systems ) Power box ( consists of the primary power supply and the power control system ) Rapid cooling unit ( option for Fast Thermal Processing Systems ) Pump box ( option for LPCVD systems )OEM 代工型號說明
The Alpha-303i is a 300mm production tool developed by Tokyo Electron. It is the result of years of research and development, with TEL having completed their 300mm batch furnace prototype in 1995. Since then, TEL has delivered numerous atmospheric and LP CVD systems to multiple customer sites and consortia worldwide. The Alpha-303i includes key features such as a 100 product wafer load size, a high-speed multiple-wafer loading system with optical notch alignment, and a Front-Opening Unified Pod (FOUP) interface that is configurable for overhead transfer systems (OHT) and personal guided vehicles (PGV). Additionally, boat rotation is standard on all processes, and a Fast Thermal Processing System (FTP) is available for both atmospheric and CVD systems. This tool reinforces TEL’s commitment to being production ready for the 300mm era of semiconductor manufacturing.文檔
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TEL / TOKYO ELECTRON
ALPHA(α)-303i
已驗證
類別
Furnaces / Diffusion
上次驗證: 超過60天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
72827
晶圓尺寸:
12"/300mm
年份:
2005
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
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TEL / TOKYO ELECTRON
ALPHA(α)-303i
類別
Furnaces / Diffusion
上次驗證: 超過60天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
72827
晶圓尺寸:
12"/300mm
年份:
2005
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
描述
MISSING PARTS: (1 set) Quarts wares - Process tube, etc. Equipment Status: Out of Fab Software OS: TEL Waves Type: Diffusion Air Valve: FUJIKIN MFC, MFM: HORIBA STEC Three phase power: 3Ø AC 208V Single phase power: 1Ø AC 120V APC: CKD GAS: PN2 / N2 / 0.1%PH3 / SiH4 / He / ClF3配置
The furnace sub-system includes the following major components: - Automation system - Heater - Process chamber - Temperature controller - Scavenger - Cooling water unit The gas sub-system includes the following major components: - Gas supply unit - Exhaust - Vacuum line ( for LPCVD systems ) Power box ( consists of the primary power supply and the power control system ) Rapid cooling unit ( option for Fast Thermal Processing Systems ) Pump box ( option for LPCVD systems )OEM 代工型號說明
The Alpha-303i is a 300mm production tool developed by Tokyo Electron. It is the result of years of research and development, with TEL having completed their 300mm batch furnace prototype in 1995. Since then, TEL has delivered numerous atmospheric and LP CVD systems to multiple customer sites and consortia worldwide. The Alpha-303i includes key features such as a 100 product wafer load size, a high-speed multiple-wafer loading system with optical notch alignment, and a Front-Opening Unified Pod (FOUP) interface that is configurable for overhead transfer systems (OHT) and personal guided vehicles (PGV). Additionally, boat rotation is standard on all processes, and a Fast Thermal Processing System (FTP) is available for both atmospheric and CVD systems. This tool reinforces TEL’s commitment to being production ready for the 300mm era of semiconductor manufacturing.文檔
無文檔