描述
MISSING PARTS: (1 set) Quartz wares - process tube, etc. Software OS: CX1000 Equipment status: Out of Fab Process: PYRO Type: Diffusion Air valve: FUJIKIN MFC, MFM: STEC Three phase power: 1Ø AC 200V Single phase power: 1Ø AC 200V Gas: PN2 / H2 / O2配置
Process: PYRO The furnace subsystem includes the following major components: - Automation system - Heater - Process chamber - Cooling water unit - Scavenger - Temperature controller The gas subsystem includes the following major components: - Power box ( consists of the primary power supply and the power control system ) - Gas supply unit - Exhaust - Vacuum line ( for LPCVD systems ) - Temperature controller Power box ( consists of the primary power supply and the power control system ) Rapid cooling unit ( option for Fast Thermal Processing Systems ) Pump box ( option for LPCVD systems )OEM 代工型號說明
DD-802V for diffusion. The vertical reactor can accommodate 120 150mm wafers and up to 165 in the future.文檔
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KOKUSAI-ELECTRIC (KE)
DD-802V
已驗證
類別
Furnaces / Diffusion
上次驗證: 超過60天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
72845
晶圓尺寸:
6"/150mm
年份:
1990
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
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KOKUSAI-ELECTRIC (KE)
DD-802V
類別
Furnaces / Diffusion
上次驗證: 超過60天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
72845
晶圓尺寸:
6"/150mm
年份:
1990
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
描述
MISSING PARTS: (1 set) Quartz wares - process tube, etc. Software OS: CX1000 Equipment status: Out of Fab Process: PYRO Type: Diffusion Air valve: FUJIKIN MFC, MFM: STEC Three phase power: 1Ø AC 200V Single phase power: 1Ø AC 200V Gas: PN2 / H2 / O2配置
Process: PYRO The furnace subsystem includes the following major components: - Automation system - Heater - Process chamber - Cooling water unit - Scavenger - Temperature controller The gas subsystem includes the following major components: - Power box ( consists of the primary power supply and the power control system ) - Gas supply unit - Exhaust - Vacuum line ( for LPCVD systems ) - Temperature controller Power box ( consists of the primary power supply and the power control system ) Rapid cooling unit ( option for Fast Thermal Processing Systems ) Pump box ( option for LPCVD systems )OEM 代工型號說明
DD-802V for diffusion. The vertical reactor can accommodate 120 150mm wafers and up to 165 in the future.文檔
無文檔