KOKUSAI-ELECTRIC (KE)

DD 802V H

QUIXACE II DOPED POLY

DJ 853V 8BL

DJ-1223VN	

QUIXACE II

QUIXACE II POLY

DD-812V

QUIXACE II NITRIDE

"VERTRON-III(F3) Model Numbers:DD-823V/DJ-823V. Hitachi Kokusai Electric's Vertron-III series Vertical Diffusion/LPCVD systems have been developed especially for 200mm wafers which are predominantly used in high-volume-semiconductor device manufacturing. The Vertron-III platform offers solid reliability and provides superior cost of ownership (Co0)to our customers.
 
The Vertron-III offers all conventional films as well as the unique processes of BTBAS Si3N4, and Selective SiGe epitaxy. Hitachi Kokusai is recognized as a leader in thermal solutions and customer satisfaction."

DD-823V

DJ 1236VN DF

"VERTRON-III(J3). Model Numbers: DD-853V/DJ-853V. Hitachi Kokusai Electric's Vertron-III series Vertical Diffusion/LPCVD systems have been developed especially for 200mm wafers which are predominantly used in high-volume-semiconductor device manufacturing. The Vertron-III platform offers solid reliability and provides superior cost of ownership (Co0)to our customers.
 
The Vertron-III offers all conventional films as well as the unique processes of BTBAS Si3N4, and Selective SiGe epitaxy. Hitachi Kokusai is recognized as a leader in thermal solutions and customer satisfaction."

DJ 853V

"VERTRON-III(G) Model Numbers:DD-833V/DJ-833V. Hitachi Kokusai Electric's Vertron-III series Vertical Diffusion/LPCVD systems have been developed especially for 200mm wafers which are predominantly used in high-volume-semiconductor device manufacturing. The Vertron-III platform offers solid reliability and provides superior cost of ownership (Co0)to our customers.
 
The Vertron-III offers all conventional films as well as the unique processes of BTBAS Si3N4, and Selective SiGe epitaxy. Hitachi Kokusai is recognized as a leader in thermal solutions and customer satisfaction."

DJ 833V

QUIXACE ULTIMATE

DD 803V

DJ 1206V-DF

DD-802V for diffusion.
The vertical reactor can accommodate 120 150mm wafers and up to 165 in the future.

DD-802V

QUIXACE II ALD NITRIDE 

DJ 1223V

DJ-1223 VN-DF

CX 3000

DJ-802V for LPCVD.
For LPCVD films, from 50 to 100 wafers are processed, depending on the film. 

DJ-802V

DD1223V

"VERTRON-III(F3). Model Numbers: DD-823V/DJ-823V. Hitachi Kokusai Electric's Vertron-III series Vertical Diffusion/LPCVD systems have been developed especially for 200mm wafers which are predominantly used in high-volume-semiconductor device manufacturing. The Vertron-III platform offers solid reliability and provides superior cost of ownership (Co0)to our customers.
 
The Vertron-III offers all conventional films as well as the unique processes of BTBAS Si3N4, and Selective SiGe epitaxy. Hitachi Kokusai is recognized as a leader in thermal solutions and customer satisfaction."

DJ 823V

DJ-835V

QUIXACE II ANNEAL

QUIXACE ULTIMATE ALD SIN

DD 853V

QUIXACE II CURE

DD 1223VN

CX 3202

DD803

DJ-813	

ZESTONE-III: DD-1223V

DJ 815V-8L

QUIXACE NITRIDE

DJ 802

DD 823V-8BL

CX 2000

DJ-813V

DD 1205V

QUIXACE ULTIMATE ALD SIO2

VERTRON DD-803V

DJ 803V

Vertical furnace, HTO (High Temperature Oxide)

DD 853V-8BL

DJ-802V-H

ADVANCED ACE-300

"VERTRON-III(G) Model Numbers: DD-833V/DJ-833V. Hitachi Kokusai Electric's Vertron-III series Vertical Diffusion/LPCVD systems have been developed especially for 200mm wafers which are predominantly used in high-volume-semiconductor device manufacturing. The Vertron-III platform offers solid reliability and provides superior cost of ownership (Co0)to our customers.
 
The Vertron-III offers all conventional films as well as the unique processes of BTBAS Si3N4, and Selective SiGe epitaxy. Hitachi Kokusai is recognized as a leader in thermal solutions and customer satisfaction."

DD 833V

QUIXACE ULTIMATE ALD TIN

QUIXACE II ALD HIGH-K

DJ 1207S

DD 1206V DF

Vertex-III(F)

DJ 1206-VN-DF

"VERTEX-(S2).Model Numbers: DD-835V/DJ-835VAs semiconductor devices becomes more highly integrated and miniaturized, it is necessary to control native oxide film growth on the wafer surface at the time of loading for applications such as formation of contact Poly-Si, capacitor nitride, ultra thin oxidation and selective oxidation, etc.
Hitachi Kokusai Electric recommends Load Lock vertical Diffusion/LPCVD Systems, Vertron-V, for these processes to utilize the unique oxygen free load lock chamber mounted directly underneath reactor tube."

DJ 835

DD-1223 V-DF 

DD1223VNP

DD 802V-B

DD 1236VN DF

DD 853

ZESTONE NITR

DJ1206VN

DJ 1206-VN HKE

VERTEX II

ZESTONE-V(B) DJ-1205V-DF

QUIXACE DJ-1206-VN

DD-1810N-DLS

DJ-807S-8C

"VERTRON-V(S2). Model Numbers: DD-835V/DJ-853V. As semiconductor devices becomes more highly integrated and miniaturized, it is necessary to control native oxide film growth on the wafer surface at the time of loading for applications such as formation of contact Poly-Si, capacitor nitride, ultra thin oxidation and selective oxidation, etc.
Hitachi Kokusai Electric recommends Load Lock vertical Diffusion/LPCVD Systems, Vertron-V, for these processes to utilize the unique oxygen free load lock chamber mounted directly underneath reactor tube."

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最熱門的 KOKUSAI-ELECTRIC (KE) Furnaces / Diffusion

DD 802V H

QUIXACE II DOPED POLY

DJ 853V 8BL

DJ-1223VN

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