描述
無描述配置
200MM Etch P5000 Mark II Mainframe 8 slot storage elevator Phase III robot SATA RAID dual hard drive system (upgrade) Compact flash floppy replacement drive (upgrade) Flat screen monitor x2 (upgrade) Two (2) Neslab HX 150 50Ft. Hoses and cabling Remote frame with two (2) 13.56Mhz generators 12 slot gas panel Chamber A: MxP+ Oxide Etch Oxide Process MxP+ etch chamber HV module MxP+ match 1 torr process manometer Pumpstack with gate valve and removable throttle Simple cathode 200mm Polyimid ESC process kit Turbo MFC’s cal’d to customer spec. Chamber B: MxP+ Oxide Etch Oxide Process MxP+ etch chamber HV module MxP+ match 1 torr process manometer Pumpstack with gate valve and removable throttle Simple cathode 200mm Polyimid ESC process kit Turbo MFC’s cal’d to customer spec.OEM 代工型號說明
The AMAT P5000 Etch is a magnetically enhanced reactive ion etching system (MERIE) with two functional process chambers (Chambers B & C). P5000 Chamber B is primarily used for etching silicon based dielectrics (silicon dioxide, silcon nitride, etc.) and some carbon based compounds (resist, poly imide, etc) while chamber C is mainly used for silicon etching with high selectivity to underlying dielectric such as silicon dioxide. The system can process only 4" wafers. Pieces have to be attached to a 4" wafer. Though the process chamber processes one wafer at a time, up to 25 wafers can be loaded per batch.文檔
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APPLIED MATERIALS (AMAT)
P5000 ETCH
已驗證
類別
Etch/Asher
上次驗證: 昨日
關鍵商品詳情
條件:
Refurbished
作業狀態:
Deinstalled
產品編號:
113063
晶圓尺寸:
未知
年份:
未知
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
類似上架商品
查看全部APPLIED MATERIALS (AMAT)
P5000 ETCH
類別
Etch/Asher
上次驗證: 昨日
關鍵商品詳情
條件:
Refurbished
作業狀態:
Deinstalled
產品編號:
113063
晶圓尺寸:
未知
年份:
未知
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
描述
無描述配置
200MM Etch P5000 Mark II Mainframe 8 slot storage elevator Phase III robot SATA RAID dual hard drive system (upgrade) Compact flash floppy replacement drive (upgrade) Flat screen monitor x2 (upgrade) Two (2) Neslab HX 150 50Ft. Hoses and cabling Remote frame with two (2) 13.56Mhz generators 12 slot gas panel Chamber A: MxP+ Oxide Etch Oxide Process MxP+ etch chamber HV module MxP+ match 1 torr process manometer Pumpstack with gate valve and removable throttle Simple cathode 200mm Polyimid ESC process kit Turbo MFC’s cal’d to customer spec. Chamber B: MxP+ Oxide Etch Oxide Process MxP+ etch chamber HV module MxP+ match 1 torr process manometer Pumpstack with gate valve and removable throttle Simple cathode 200mm Polyimid ESC process kit Turbo MFC’s cal’d to customer spec.OEM 代工型號說明
The AMAT P5000 Etch is a magnetically enhanced reactive ion etching system (MERIE) with two functional process chambers (Chambers B & C). P5000 Chamber B is primarily used for etching silicon based dielectrics (silicon dioxide, silcon nitride, etc.) and some carbon based compounds (resist, poly imide, etc) while chamber C is mainly used for silicon etching with high selectivity to underlying dielectric such as silicon dioxide. The system can process only 4" wafers. Pieces have to be attached to a 4" wafer. Though the process chamber processes one wafer at a time, up to 25 wafers can be loaded per batch.文檔
無文檔