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APPLIED MATERIALS (AMAT) P5000 ETCH
  • APPLIED MATERIALS (AMAT) P5000 ETCH
  • APPLIED MATERIALS (AMAT) P5000 ETCH
  • APPLIED MATERIALS (AMAT) P5000 ETCH
  • APPLIED MATERIALS (AMAT) P5000 ETCH
  • APPLIED MATERIALS (AMAT) P5000 ETCH
  • APPLIED MATERIALS (AMAT) P5000 ETCH
  • APPLIED MATERIALS (AMAT) P5000 ETCH
  • APPLIED MATERIALS (AMAT) P5000 ETCH
  • APPLIED MATERIALS (AMAT) P5000 ETCH
  • APPLIED MATERIALS (AMAT) P5000 ETCH
  • APPLIED MATERIALS (AMAT) P5000 ETCH
  • APPLIED MATERIALS (AMAT) P5000 ETCH
  • APPLIED MATERIALS (AMAT) P5000 ETCH
  • APPLIED MATERIALS (AMAT) P5000 ETCH
  • APPLIED MATERIALS (AMAT) P5000 ETCH
  • APPLIED MATERIALS (AMAT) P5000 ETCH
  • APPLIED MATERIALS (AMAT) P5000 ETCH
  • APPLIED MATERIALS (AMAT) P5000 ETCH
  • APPLIED MATERIALS (AMAT) P5000 ETCH
  • APPLIED MATERIALS (AMAT) P5000 ETCH
  • APPLIED MATERIALS (AMAT) P5000 ETCH
  • APPLIED MATERIALS (AMAT) P5000 ETCH
  • APPLIED MATERIALS (AMAT) P5000 ETCH
  • APPLIED MATERIALS (AMAT) P5000 ETCH
  • APPLIED MATERIALS (AMAT) P5000 ETCH
  • APPLIED MATERIALS (AMAT) P5000 ETCH
  • APPLIED MATERIALS (AMAT) P5000 ETCH
  • APPLIED MATERIALS (AMAT) P5000 ETCH
  • APPLIED MATERIALS (AMAT) P5000 ETCH
描述
Including - clamp Mark II chamber *2 - endpoint and minicontroller
配置
無配置
OEM 代工型號說明
The AMAT P5000 Etch is a magnetically enhanced reactive ion etching system (MERIE) with two functional process chambers (Chambers B & C). P5000 Chamber B is primarily used for etching silicon based dielectrics (silicon dioxide, silcon nitride, etc.) and some carbon based compounds (resist, poly imide, etc) while chamber C is mainly used for silicon etching with high selectivity to underlying dielectric such as silicon dioxide. The system can process only 4" wafers. Pieces have to be attached to a 4" wafer. Though the process chamber processes one wafer at a time, up to 25 wafers can be loaded per batch.
文檔

無文檔

類別
Dry / Plasma Etch

上次驗證: 超過60天前

關鍵商品詳情

條件:

Used


作業狀態:

未知


產品編號:

75405


晶圓尺寸:

6"/150mm


年份:

1995


Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
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APPLIED MATERIALS (AMAT)

P5000 ETCH

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已驗證
類別
Dry / Plasma Etch
上次驗證: 超過60天前
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關鍵商品詳情

條件:

Used


作業狀態:

未知


產品編號:

75405


晶圓尺寸:

6"/150mm


年份:

1995


Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
描述
Including - clamp Mark II chamber *2 - endpoint and minicontroller
配置
無配置
OEM 代工型號說明
The AMAT P5000 Etch is a magnetically enhanced reactive ion etching system (MERIE) with two functional process chambers (Chambers B & C). P5000 Chamber B is primarily used for etching silicon based dielectrics (silicon dioxide, silcon nitride, etc.) and some carbon based compounds (resist, poly imide, etc) while chamber C is mainly used for silicon etching with high selectivity to underlying dielectric such as silicon dioxide. The system can process only 4" wafers. Pieces have to be attached to a 4" wafer. Though the process chamber processes one wafer at a time, up to 25 wafers can be loaded per batch.
文檔

無文檔

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