描述
NuFlare EGV-30GX 6"Susceptor(Covalent Material)φ740mm The Susceptor serves functions such as wafer positioning, uniform heat conduction, and improving the flow field of reactive gases with rotation.配置
Size: - Ø740 mm - Ø150 mm Thickness: - 14.4mm Weight: - 10KGOEM 代工型號說明
Epitaxial reactor (CVD/epitaxial growth system) used in semiconductor manufacturing文檔
無文檔
NUFLARE
EGV-30GX
類別
Epitaxial deposition (EPI)
上次驗證: 13 天前
關鍵商品詳情
條件:
Parts Tool
作業狀態:
未知
產品編號:
152531
晶圓尺寸:
6"/150mm
年份:
2015
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
描述
NuFlare EGV-30GX 6"Susceptor(Covalent Material)φ740mm The Susceptor serves functions such as wafer positioning, uniform heat conduction, and improving the flow field of reactive gases with rotation.配置
Size: - Ø740 mm - Ø150 mm Thickness: - 14.4mm Weight: - 10KGOEM 代工型號說明
Epitaxial reactor (CVD/epitaxial growth system) used in semiconductor manufacturing文檔
無文檔