描述
For EGV-30GX Vertical Eqitaxial Reactor System 4"Susceptor NuFlare EGV-30GX 4" Susceptor (Covalent Material) φ740mm (4"" Deep Pocket ) The Susceptor serves functions such as wafer positioning, uniform heat conduction, and improving the flow field of reactive gases with rotation.配置
Size: - φ740mm - φ100mm Thickness: - 14.4mm Weight: - 10Kg/EAOEM 代工型號說明
Epitaxial reactor (CVD/epitaxial growth system) used in semiconductor manufacturing文檔
無文檔
NUFLARE
EGV-30GX
類別
Epitaxial deposition (EPI)
上次驗證: 13 天前
關鍵商品詳情
條件:
Parts Tool
作業狀態:
未知
產品編號:
152532
晶圓尺寸:
4"/100mm
年份:
2015
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
描述
For EGV-30GX Vertical Eqitaxial Reactor System 4"Susceptor NuFlare EGV-30GX 4" Susceptor (Covalent Material) φ740mm (4"" Deep Pocket ) The Susceptor serves functions such as wafer positioning, uniform heat conduction, and improving the flow field of reactive gases with rotation.配置
Size: - φ740mm - φ100mm Thickness: - 14.4mm Weight: - 10Kg/EAOEM 代工型號說明
Epitaxial reactor (CVD/epitaxial growth system) used in semiconductor manufacturing文檔
無文檔