描述
無描述配置
AS-IS AMAT Centura HTF 3ch Epi system, ATM ‐ 200mm ‐ Centura 5200 HTF Toxic Epi mainframe - 480V/60Hz/600A - Wide Body ENP loadlocks ‐ Wafer mapping ‐ HP robot ‐ Remote Centerfinding ‐ Epi chamber RP Position: A, B, C * R3.4 rotation assy * Variable Speed Blower ‐ Single slot non-contact cooldown chamber, position F ‐ Legacy Gas Panel (USED) * H2 Slit - 20 SLM * H2 Main - 100 SLM * HCL - 1 SLM * DCS - 1 SLM (Not Used, was RP tool) * MixDop - 300 SCCM * TCS - 30 SLM * Direct Dop - 500 SCCMOEM 代工型號說明
The Centura architecture clusters four processing stations and two auxiliary chambers around a central transfer module containing an ultra-reliable magnetically-coupled vacuum robot.文檔
無文檔
APPLIED MATERIALS (AMAT)
CENTURA 5200 HTF
已驗證
類別
Epitaxial deposition (EPI)
上次驗證: 超過60天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
67521
晶圓尺寸:
未知
年份:
1997
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
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APPLIED MATERIALS (AMAT)
CENTURA 5200 HTF
類別
Epitaxial deposition (EPI)
上次驗證: 超過60天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
67521
晶圓尺寸:
未知
年份:
1997
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
描述
無描述配置
AS-IS AMAT Centura HTF 3ch Epi system, ATM ‐ 200mm ‐ Centura 5200 HTF Toxic Epi mainframe - 480V/60Hz/600A - Wide Body ENP loadlocks ‐ Wafer mapping ‐ HP robot ‐ Remote Centerfinding ‐ Epi chamber RP Position: A, B, C * R3.4 rotation assy * Variable Speed Blower ‐ Single slot non-contact cooldown chamber, position F ‐ Legacy Gas Panel (USED) * H2 Slit - 20 SLM * H2 Main - 100 SLM * HCL - 1 SLM * DCS - 1 SLM (Not Used, was RP tool) * MixDop - 300 SCCM * TCS - 30 SLM * Direct Dop - 500 SCCMOEM 代工型號說明
The Centura architecture clusters four processing stations and two auxiliary chambers around a central transfer module containing an ultra-reliable magnetically-coupled vacuum robot.文檔
無文檔