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KLA ALERIS 8350
    描述
    THIN FILMS MEASUREMENT TOOL; CU
    配置
    無配置
    OEM 代工型號說明
    The Aleris 8350 is a high-performance film metrology system that meets the tighter process tolerances required for thickness, refractive index and stress measurements on critical films. The Aleris 8350 film thickness measurement system is used for advanced film development, characterization and process control for a wide range of critical films, including ultra-thin diffusion layers, ultra-thin gate oxides, advanced photoresists, 193nm ARC layers, ultra-thin multi-layer stacks, and CVD layers.
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    KLA

    ALERIS 8350

    verified-listing-icon

    已驗證

    類別
    Elipsometry

    上次驗證: 15 天前

    關鍵商品詳情

    條件:

    Used


    作業狀態:

    未知


    產品編號:

    92891


    晶圓尺寸:

    未知


    年份:

    未知


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    類似上架商品
    查看全部
    KLA ALERIS 8350

    KLA

    ALERIS 8350

    Elipsometry
    年份: 0條件: 二手
    上次驗證15 天前

    KLA

    ALERIS 8350

    verified-listing-icon
    已驗證
    類別
    Elipsometry
    上次驗證: 15 天前
    listing-photo-293d01f7f2314453a65e59159bca285b-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
    關鍵商品詳情

    條件:

    Used


    作業狀態:

    未知


    產品編號:

    92891


    晶圓尺寸:

    未知


    年份:

    未知


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    描述
    THIN FILMS MEASUREMENT TOOL; CU
    配置
    無配置
    OEM 代工型號說明
    The Aleris 8350 is a high-performance film metrology system that meets the tighter process tolerances required for thickness, refractive index and stress measurements on critical films. The Aleris 8350 film thickness measurement system is used for advanced film development, characterization and process control for a wide range of critical films, including ultra-thin diffusion layers, ultra-thin gate oxides, advanced photoresists, 193nm ARC layers, ultra-thin multi-layer stacks, and CVD layers.
    文檔

    無文檔

    類似上架商品
    查看全部
    KLA ALERIS 8350

    KLA

    ALERIS 8350

    Elipsometry年份: 0條件: 二手上次驗證:15 天前
    KLA ALERIS 8350

    KLA

    ALERIS 8350

    Elipsometry年份: 0條件: 二手上次驗證:超過60天前
    KLA ALERIS 8350

    KLA

    ALERIS 8350

    Elipsometry年份: 0條件: 二手上次驗證:超過60天前