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PLASMATHERM VERSALINE ICP
    描述
    New in OEM crate, never used.
    配置
    Plasma-Therm Versaline DSE-IV Configured for 150mm, upgradeable to 200mm PAGE PAGE DESCRIPTION DOCUMENT CHANGES 2 CONFIGURATION SPECIFIC LAYOUT INITIAL RELEASE 3 EQUIPMENT IDENTIFICATION INITIAL RELEASE 4 MODULE DETAIL : PROCESS MODULE INITIAL RELEASE 5 MODULE DETAIL : PSU INITIAL RELEASE MODULE DETAIL : UT INITIAL RELEASE 6 CABLE INTERCONNECT INITIAL RELEASE 7 VACUUM PUMPS INITIAL RELEASE FOOTPAD LAYOUT INITIAL RELEASE HEAT EXCHANGER UNIT INITIAL RELEASE TM-VPU INTERFACE OPTIONS INITIAL RELEASE 8 UTILITIES REQUIREMENTS INITIAL RELEASE GAS LINE CONFIGURATION INITIAL RELEASE
    OEM 代工型號說明
    "The PLASMA-THERM VERSALINE ICP is an Inductive Couple Plasma (ICP) etch platform that has been developed over decades of technological evolution at Plasma-Therm®. It offers high flexibility for application-optimized processes, with a large library of processes for a variety of applications, including wireless, photonics, power devices, compound semiconductors, memory, quantum, and advanced packaging. The platform can handle a wide range of materials, including II-VIs and III-Vs, silicon-based materials, dielectrics, polymers, metals, metal oxides and nitrides, and piezoelectrics. It also supports corrosive chemistry with corrosion-resistant components. The hardware of the VERSALINE ICP is flexible and configurable, with options for handling cassette cluster systems or single-substrate loadlocks. It features a 2MHz ICP source that is heated for process stability and decreased first wafer effects, as well as increased MTBC. The substrate bias can be 13.56MHz or an optional 40MHz, and the substrate temperature can be controlled with backside helium using mechanical or electrostatic clamping. The platform also offers application-specific substrate electrode temperature ranges. The VERSALINE ICP is controlled by the Cortex control system and supports the EndpointWorks program for laser, optical emission, and other system parameter-based endpoints."
    文檔

    PLASMATHERM

    VERSALINE ICP

    verified-listing-icon

    已驗證

    類別
    Dry / Plasma Etch

    上次驗證: 超過60天前

    關鍵商品詳情

    條件:

    Used


    作業狀態:

    未知


    產品編號:

    100265


    晶圓尺寸:

    6"/150mm


    年份:

    2020


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    類似上架商品
    查看全部
    PLASMATHERM VERSALINE ICP

    PLASMATHERM

    VERSALINE ICP

    Dry / Plasma Etch
    年份: 2012條件: 二手
    上次驗證超過30天前

    PLASMATHERM

    VERSALINE ICP

    verified-listing-icon
    已驗證
    類別
    Dry / Plasma Etch
    上次驗證: 超過60天前
    listing-photo-87c330a1af764c1a8dfad2a764ce68df-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
    關鍵商品詳情

    條件:

    Used


    作業狀態:

    未知


    產品編號:

    100265


    晶圓尺寸:

    6"/150mm


    年份:

    2020


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    描述
    New in OEM crate, never used.
    配置
    Plasma-Therm Versaline DSE-IV Configured for 150mm, upgradeable to 200mm PAGE PAGE DESCRIPTION DOCUMENT CHANGES 2 CONFIGURATION SPECIFIC LAYOUT INITIAL RELEASE 3 EQUIPMENT IDENTIFICATION INITIAL RELEASE 4 MODULE DETAIL : PROCESS MODULE INITIAL RELEASE 5 MODULE DETAIL : PSU INITIAL RELEASE MODULE DETAIL : UT INITIAL RELEASE 6 CABLE INTERCONNECT INITIAL RELEASE 7 VACUUM PUMPS INITIAL RELEASE FOOTPAD LAYOUT INITIAL RELEASE HEAT EXCHANGER UNIT INITIAL RELEASE TM-VPU INTERFACE OPTIONS INITIAL RELEASE 8 UTILITIES REQUIREMENTS INITIAL RELEASE GAS LINE CONFIGURATION INITIAL RELEASE
    OEM 代工型號說明
    "The PLASMA-THERM VERSALINE ICP is an Inductive Couple Plasma (ICP) etch platform that has been developed over decades of technological evolution at Plasma-Therm®. It offers high flexibility for application-optimized processes, with a large library of processes for a variety of applications, including wireless, photonics, power devices, compound semiconductors, memory, quantum, and advanced packaging. The platform can handle a wide range of materials, including II-VIs and III-Vs, silicon-based materials, dielectrics, polymers, metals, metal oxides and nitrides, and piezoelectrics. It also supports corrosive chemistry with corrosion-resistant components. The hardware of the VERSALINE ICP is flexible and configurable, with options for handling cassette cluster systems or single-substrate loadlocks. It features a 2MHz ICP source that is heated for process stability and decreased first wafer effects, as well as increased MTBC. The substrate bias can be 13.56MHz or an optional 40MHz, and the substrate temperature can be controlled with backside helium using mechanical or electrostatic clamping. The platform also offers application-specific substrate electrode temperature ranges. The VERSALINE ICP is controlled by the Cortex control system and supports the EndpointWorks program for laser, optical emission, and other system parameter-based endpoints."
    文檔
    類似上架商品
    查看全部
    PLASMATHERM VERSALINE ICP

    PLASMATHERM

    VERSALINE ICP

    Dry / Plasma Etch年份: 2012條件: 二手上次驗證:超過30天前
    PLASMATHERM VERSALINE ICP

    PLASMATHERM

    VERSALINE ICP

    Dry / Plasma Etch年份: 0條件: 二手上次驗證:超過60天前
    PLASMATHERM VERSALINE ICP

    PLASMATHERM

    VERSALINE ICP

    Dry / Plasma Etch年份: 0條件: 二手上次驗證:超過60天前