跳到主要內容
6" Fab For Sale from Moov - Click Here to Learn More
6" Fab For Sale from Moov - Click Here to Learn More
Moov logo

6" Fab For Sale from Moov - Click Here to Learn More
Moov Icon
PLASMATHERM VERSALINE ICP
    描述
    PlasmaTherm Versaline DSE-III Deep Silicon Etcher Single chamber with single wafer semi-auto load lock Operational, GUI PC and CTC PC in e-rack are not working. Low Maintenance Package Through-wall panel is not included
    配置
    Main specification (ask for details): - Application: deep silicon etch - Substrate size: 4”,6”,8”. Mechanical clamp -40C..+40C with Affinity chiller - Semi-auto load lock, single wafer - Plasma-Therm ICP-II DSE 3-turn source - 3.5kW, 2MHz ICP RF package (5kW limited to 3.5kW) - High-Speed Process Modulation w/ 1-100kHz DBS RF package for DSE - Heated chamber 180C - Optical End Point Detection - Gas box with 4 lines (C4F8, SF6, Ar, O2. 400/600/50/50sccm) - Fast gas switching option for DSE - User terminal mobile cart - Edwards ih80 dry pump - Edwards xds35i load lock dry pump - Edwards 1300l/s STPA turbo - 380VAC 3 phase (with transformer) - Low Maintenance Package - Through-wall panel is not included
    OEM 代工型號說明
    "The PLASMA-THERM VERSALINE ICP is an Inductive Couple Plasma (ICP) etch platform that has been developed over decades of technological evolution at Plasma-Therm®. It offers high flexibility for application-optimized processes, with a large library of processes for a variety of applications, including wireless, photonics, power devices, compound semiconductors, memory, quantum, and advanced packaging. The platform can handle a wide range of materials, including II-VIs and III-Vs, silicon-based materials, dielectrics, polymers, metals, metal oxides and nitrides, and piezoelectrics. It also supports corrosive chemistry with corrosion-resistant components. The hardware of the VERSALINE ICP is flexible and configurable, with options for handling cassette cluster systems or single-substrate loadlocks. It features a 2MHz ICP source that is heated for process stability and decreased first wafer effects, as well as increased MTBC. The substrate bias can be 13.56MHz or an optional 40MHz, and the substrate temperature can be controlled with backside helium using mechanical or electrostatic clamping. The platform also offers application-specific substrate electrode temperature ranges. The VERSALINE ICP is controlled by the Cortex control system and supports the EndpointWorks program for laser, optical emission, and other system parameter-based endpoints."
    文檔

    無文檔

    PLASMATHERM

    VERSALINE ICP

    verified-listing-icon

    已驗證

    類別
    Dry / Plasma Etch

    上次驗證: 16 天前

    關鍵商品詳情

    條件:

    Used


    作業狀態:

    未知


    產品編號:

    115315


    晶圓尺寸:

    4"/100mm, 6"/150mm, 8"/200mm


    年份:

    2012


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    類似上架商品
    查看全部
    PLASMATHERM VERSALINE ICP

    PLASMATHERM

    VERSALINE ICP

    Dry / Plasma Etch
    年份: 2012條件: 二手
    上次驗證16 天前

    PLASMATHERM

    VERSALINE ICP

    verified-listing-icon
    已驗證
    類別
    Dry / Plasma Etch
    上次驗證: 16 天前
    listing-photo-5225855a22bd4e2e919ad3bfca7ee72d-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/9626/5225855a22bd4e2e919ad3bfca7ee72d/22bbaa9cd4b941b0bd5b9217302c6b2f_plasmathermversalinedseiiillphoto4_mw.jpg
    listing-photo-5225855a22bd4e2e919ad3bfca7ee72d-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/9626/5225855a22bd4e2e919ad3bfca7ee72d/63c321b5c1ce4f61930073e00d159782_plasmathermversalinedseiiillphoto3_mw.jpg
    listing-photo-5225855a22bd4e2e919ad3bfca7ee72d-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/9626/5225855a22bd4e2e919ad3bfca7ee72d/17cfec8d6ddf4e92a608d98ec74d413e_plasmathermversalinedseiiillphoto8_mw.jpg
    listing-photo-5225855a22bd4e2e919ad3bfca7ee72d-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/9626/5225855a22bd4e2e919ad3bfca7ee72d/929ffbb0808445c18ded2e8ca6ae7b25_plasmathermversalinedseiiillphoto2_mw.jpg
    listing-photo-5225855a22bd4e2e919ad3bfca7ee72d-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/9626/5225855a22bd4e2e919ad3bfca7ee72d/7851c09ff2214e97acba0c0d5aeec772_plasmathermversalinedseiiillphoto5_mw.jpg
    listing-photo-5225855a22bd4e2e919ad3bfca7ee72d-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/9626/5225855a22bd4e2e919ad3bfca7ee72d/082d77d45f54447eb1f8299ef776070c_plasmathermversalinedseiiillphoto6_mw.jpg
    listing-photo-5225855a22bd4e2e919ad3bfca7ee72d-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/9626/5225855a22bd4e2e919ad3bfca7ee72d/5ea200be0fa5486dab16db04e4a3b018_plasmathermversalinedseiiillphoto7_mw.jpg
    listing-photo-5225855a22bd4e2e919ad3bfca7ee72d-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/9626/5225855a22bd4e2e919ad3bfca7ee72d/b6845b1220b440b1880d0ee8d3494a62_plasmathermversalinedseiiillphoto1_mw.jpg
    關鍵商品詳情

    條件:

    Used


    作業狀態:

    未知


    產品編號:

    115315


    晶圓尺寸:

    4"/100mm, 6"/150mm, 8"/200mm


    年份:

    2012


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    描述
    PlasmaTherm Versaline DSE-III Deep Silicon Etcher Single chamber with single wafer semi-auto load lock Operational, GUI PC and CTC PC in e-rack are not working. Low Maintenance Package Through-wall panel is not included
    配置
    Main specification (ask for details): - Application: deep silicon etch - Substrate size: 4”,6”,8”. Mechanical clamp -40C..+40C with Affinity chiller - Semi-auto load lock, single wafer - Plasma-Therm ICP-II DSE 3-turn source - 3.5kW, 2MHz ICP RF package (5kW limited to 3.5kW) - High-Speed Process Modulation w/ 1-100kHz DBS RF package for DSE - Heated chamber 180C - Optical End Point Detection - Gas box with 4 lines (C4F8, SF6, Ar, O2. 400/600/50/50sccm) - Fast gas switching option for DSE - User terminal mobile cart - Edwards ih80 dry pump - Edwards xds35i load lock dry pump - Edwards 1300l/s STPA turbo - 380VAC 3 phase (with transformer) - Low Maintenance Package - Through-wall panel is not included
    OEM 代工型號說明
    "The PLASMA-THERM VERSALINE ICP is an Inductive Couple Plasma (ICP) etch platform that has been developed over decades of technological evolution at Plasma-Therm®. It offers high flexibility for application-optimized processes, with a large library of processes for a variety of applications, including wireless, photonics, power devices, compound semiconductors, memory, quantum, and advanced packaging. The platform can handle a wide range of materials, including II-VIs and III-Vs, silicon-based materials, dielectrics, polymers, metals, metal oxides and nitrides, and piezoelectrics. It also supports corrosive chemistry with corrosion-resistant components. The hardware of the VERSALINE ICP is flexible and configurable, with options for handling cassette cluster systems or single-substrate loadlocks. It features a 2MHz ICP source that is heated for process stability and decreased first wafer effects, as well as increased MTBC. The substrate bias can be 13.56MHz or an optional 40MHz, and the substrate temperature can be controlled with backside helium using mechanical or electrostatic clamping. The platform also offers application-specific substrate electrode temperature ranges. The VERSALINE ICP is controlled by the Cortex control system and supports the EndpointWorks program for laser, optical emission, and other system parameter-based endpoints."
    文檔

    無文檔

    類似上架商品
    查看全部
    PLASMATHERM VERSALINE ICP

    PLASMATHERM

    VERSALINE ICP

    Dry / Plasma Etch年份: 2012條件: 二手上次驗證:16 天前
    PLASMATHERM VERSALINE ICP

    PLASMATHERM

    VERSALINE ICP

    Dry / Plasma Etch年份: 0條件: 二手上次驗證:超過60天前
    PLASMATHERM VERSALINE ICP

    PLASMATHERM

    VERSALINE ICP

    Dry / Plasma Etch年份: 0條件: 二手上次驗證:超過60天前