描述
無描述配置
200mm max size (etch area is 100mm via quartz clamp) Physical etch assist via Ar Chemical etch via F or Cl Modification of etching environment toward reducing (H2) or oxidizing (O2) Cryo stage for deep RIE etching (Bosch)OEM 代工型號說明
Etching System文檔
無文檔
類別
Dry / Plasma Etch
上次驗證: 13 天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
138636
晶圓尺寸:
未知
年份:
2012
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
OXFORD
100 180 ICP
類別
Dry / Plasma Etch
上次驗證: 13 天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
138636
晶圓尺寸:
未知
年份:
2012
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
描述
無描述配置
200mm max size (etch area is 100mm via quartz clamp) Physical etch assist via Ar Chemical etch via F or Cl Modification of etching environment toward reducing (H2) or oxidizing (O2) Cryo stage for deep RIE etching (Bosch)OEM 代工型號說明
Etching System文檔
無文檔