描述
Lam AutoEtch 590, the most popular model for 4 to 6 inch wafer plasma etcher. The gap between top and bottom electrode is adjustable, which make the etcher more flexible with much better performance.配置
Main Etcher Materials: SiO2 etc.OEM 代工型號說明
The AutoEtch 590 is part of Lam Research Corporation’s AutoEtch product line, which was first introduced in January 1982. The AutoEtch series includes the 490, 590, and 690 series, designed for etching polysilicon, oxide, and aluminum film applications, respectively. The AutoEtch 590 is suitable for film applications involving line-widths of 0.8 microns or greater and wafer sizes of six inches or smaller. Despite being over fourteen years old, the AutoEtch series has undergone continued improvements in both reliability and performance.文檔
無文檔
類別
Dry / Plasma Etch
上次驗證: 8 天前
關鍵商品詳情
條件:
Refurbished
作業狀態:
未知
產品編號:
138623
晶圓尺寸:
4"/100mm, 6"/150mm
年份:
未知
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
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LAM RESEARCH CORPORATION
AUTOETCH 590
類別
Dry / Plasma Etch
上次驗證: 8 天前
關鍵商品詳情
條件:
Refurbished
作業狀態:
未知
產品編號:
138623
晶圓尺寸:
4"/100mm, 6"/150mm
年份:
未知
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
描述
Lam AutoEtch 590, the most popular model for 4 to 6 inch wafer plasma etcher. The gap between top and bottom electrode is adjustable, which make the etcher more flexible with much better performance.配置
Main Etcher Materials: SiO2 etc.OEM 代工型號說明
The AutoEtch 590 is part of Lam Research Corporation’s AutoEtch product line, which was first introduced in January 1982. The AutoEtch series includes the 490, 590, and 690 series, designed for etching polysilicon, oxide, and aluminum film applications, respectively. The AutoEtch 590 is suitable for film applications involving line-widths of 0.8 microns or greater and wafer sizes of six inches or smaller. Despite being over fourteen years old, the AutoEtch series has undergone continued improvements in both reliability and performance.文檔
無文檔