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LAM RESEARCH CORPORATION AUTOETCH 590
    描述
    無描述
    配置
    無配置
    OEM 代工型號說明
    The AutoEtch 590 is part of Lam Research Corporation’s AutoEtch product line, which was first introduced in January 1982. The AutoEtch series includes the 490, 590, and 690 series, designed for etching polysilicon, oxide, and aluminum film applications, respectively. The AutoEtch 590 is suitable for film applications involving line-widths of 0.8 microns or greater and wafer sizes of six inches or smaller. Despite being over fourteen years old, the AutoEtch series has undergone continued improvements in both reliability and performance.
    文檔

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    LAM RESEARCH CORPORATION

    AUTOETCH 590

    verified-listing-icon

    已驗證

    類別
    Dry / Plasma Etch

    上次驗證: 超過60天前

    關鍵商品詳情

    條件:

    Used


    作業狀態:

    未知


    產品編號:

    63177


    晶圓尺寸:

    未知


    年份:

    未知


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    類似上架商品
    查看全部
    LAM RESEARCH CORPORATION AUTOETCH 590

    LAM RESEARCH CORPORATION

    AUTOETCH 590

    Dry / Plasma Etch
    年份: 0條件: 二手
    上次驗證超過60天前

    LAM RESEARCH CORPORATION

    AUTOETCH 590

    verified-listing-icon
    已驗證
    類別
    Dry / Plasma Etch
    上次驗證: 超過60天前
    listing-photo-b7a384a461cf49f0af05fd46ded2c689-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
    關鍵商品詳情

    條件:

    Used


    作業狀態:

    未知


    產品編號:

    63177


    晶圓尺寸:

    未知


    年份:

    未知


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    描述
    無描述
    配置
    無配置
    OEM 代工型號說明
    The AutoEtch 590 is part of Lam Research Corporation’s AutoEtch product line, which was first introduced in January 1982. The AutoEtch series includes the 490, 590, and 690 series, designed for etching polysilicon, oxide, and aluminum film applications, respectively. The AutoEtch 590 is suitable for film applications involving line-widths of 0.8 microns or greater and wafer sizes of six inches or smaller. Despite being over fourteen years old, the AutoEtch series has undergone continued improvements in both reliability and performance.
    文檔

    無文檔

    類似上架商品
    查看全部
    LAM RESEARCH CORPORATION AUTOETCH 590

    LAM RESEARCH CORPORATION

    AUTOETCH 590

    Dry / Plasma Etch年份: 0條件: 二手上次驗證:超過60天前
    LAM RESEARCH CORPORATION AUTOETCH 590

    LAM RESEARCH CORPORATION

    AUTOETCH 590

    Dry / Plasma Etch年份: 0條件: 二手上次驗證:超過60天前
    LAM RESEARCH CORPORATION AUTOETCH 590

    LAM RESEARCH CORPORATION

    AUTOETCH 590

    Dry / Plasma Etch年份: 0條件: 二手上次驗證:超過60天前