描述
無描述配置
MXP+ OxideOEM 代工型號說明
The Centura is Applied’s most versatile platform. Launched in 1992, over 8,000 Centura systems have been shipped to customers around the world. For ≤200mm fabrication the applications supported include CVD, epitaxy, etch, plasma nitridation and RTP. In September 1992, AMAT announced its latest generation single-wafer, multichamber platform, the Centura, to target the high temperature thin films market as well as future process applications with 0.5 micron and below specifications.文檔
無文檔
APPLIED MATERIALS (AMAT)
CENTURA
已驗證
類別
Dry / Plasma Etch
上次驗證: 超過30天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
117100
晶圓尺寸:
8"/200mm
年份:
1998
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
類似上架商品
查看全部
APPLIED MATERIALS (AMAT)
CENTURA
類別
Dry / Plasma Etch
上次驗證: 超過30天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
117100
晶圓尺寸:
8"/200mm
年份:
1998
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
描述
無描述配置
MXP+ OxideOEM 代工型號說明
The Centura is Applied’s most versatile platform. Launched in 1992, over 8,000 Centura systems have been shipped to customers around the world. For ≤200mm fabrication the applications supported include CVD, epitaxy, etch, plasma nitridation and RTP. In September 1992, AMAT announced its latest generation single-wafer, multichamber platform, the Centura, to target the high temperature thin films market as well as future process applications with 0.5 micron and below specifications.文檔
無文檔