描述
No loadports included.配置
-Asset Description: APPLIED MATERIALS DPS MTAL ETCHER -Software Version: 4.7_25 -CIM: SECS -Process: MTAL ETCH -CHILLER Qty 3 (OK) -DRY PUMP Qty 6 (OK) -ECOSYS Qty 1 (OK) -AC RACK Qty 1 (OK) -RF RACK Qty 1 (OK)OEM 代工型號說明
The Centura is Applied’s most versatile platform. Launched in 1992, over 8,000 Centura systems have been shipped to customers around the world. For ≤200mm fabrication the applications supported include CVD, epitaxy, etch, plasma nitridation and RTP. In September 1992, AMAT announced its latest generation single-wafer, multichamber platform, the Centura, to target the high temperature thin films market as well as future process applications with 0.5 micron and below specifications.文檔
無文檔
類別
Dry / Plasma Etch
上次驗證: 超過60天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
104927
晶圓尺寸:
8"/200mm
年份:
2000
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
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APPLIED MATERIALS (AMAT)
CENTURA
類別
Dry / Plasma Etch
上次驗證: 超過60天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
104927
晶圓尺寸:
8"/200mm
年份:
2000
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
描述
No loadports included.配置
-Asset Description: APPLIED MATERIALS DPS MTAL ETCHER -Software Version: 4.7_25 -CIM: SECS -Process: MTAL ETCH -CHILLER Qty 3 (OK) -DRY PUMP Qty 6 (OK) -ECOSYS Qty 1 (OK) -AC RACK Qty 1 (OK) -RF RACK Qty 1 (OK)OEM 代工型號說明
The Centura is Applied’s most versatile platform. Launched in 1992, over 8,000 Centura systems have been shipped to customers around the world. For ≤200mm fabrication the applications supported include CVD, epitaxy, etch, plasma nitridation and RTP. In September 1992, AMAT announced its latest generation single-wafer, multichamber platform, the Centura, to target the high temperature thin films market as well as future process applications with 0.5 micron and below specifications.文檔
無文檔