描述
Enabler Dielectric etch chamber Turbo pump: Shimadzu / TMP-3403LMC (A2) RF Match Box: Bias: 13.5 MHz(Bias) & 2 MHz(LF Bias) LF Bias Daihen RMN-50N1 (p/n : 0190-15322) Source 60 MHz Daihen AMN-30H (p/n : 0190-15323) Gate valve: Nor-Cal / NC-95-PP RF Generator: 13.56 MHz: ENI GHW-50A (p/n : 0190-15319) 2 MHz: MKS/ENI B-11002 (p/n : Spectrum 11002-00-07012) 60 MHz AE: Ovation 35162 (amat p/n : 0190-27049) FIB: eFib, wFib (Facilities Interface Box) Chamber Equip Cart: included配置
無配置OEM 代工型號說明
The Centura architecture clusters four processing stations and two auxiliary chambers around a central transfer module containing an ultra-reliable magnetically-coupled vacuum robot. To address advanced low k etch applications, the Applied Centura Enabler Etch system performs etch, strip and clean steps in a single chamber. The Enabler’s all-in-one capability streamlines the process flow for advanced chip designs and significantly reduces operating costs. Enabler Chamber: 300mm only.文檔
無文檔
類別
Dry / Plasma Etch
上次驗證: 超過60天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
109956
晶圓尺寸:
12"/300mm
年份:
2007
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
類似上架商品
查看全部
APPLIED MATERIALS (AMAT)
CENTURA ENABLER ETCH
類別
Dry / Plasma Etch
上次驗證: 超過60天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
109956
晶圓尺寸:
12"/300mm
年份:
2007
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
描述
Enabler Dielectric etch chamber Turbo pump: Shimadzu / TMP-3403LMC (A2) RF Match Box: Bias: 13.5 MHz(Bias) & 2 MHz(LF Bias) LF Bias Daihen RMN-50N1 (p/n : 0190-15322) Source 60 MHz Daihen AMN-30H (p/n : 0190-15323) Gate valve: Nor-Cal / NC-95-PP RF Generator: 13.56 MHz: ENI GHW-50A (p/n : 0190-15319) 2 MHz: MKS/ENI B-11002 (p/n : Spectrum 11002-00-07012) 60 MHz AE: Ovation 35162 (amat p/n : 0190-27049) FIB: eFib, wFib (Facilities Interface Box) Chamber Equip Cart: included配置
無配置OEM 代工型號說明
The Centura architecture clusters four processing stations and two auxiliary chambers around a central transfer module containing an ultra-reliable magnetically-coupled vacuum robot. To address advanced low k etch applications, the Applied Centura Enabler Etch system performs etch, strip and clean steps in a single chamber. The Enabler’s all-in-one capability streamlines the process flow for advanced chip designs and significantly reduces operating costs. Enabler Chamber: 300mm only.文檔
無文檔