描述
Enabler Dielectric etch chamber Turbo pump Shimadzu / TMP-3403LMC (A2) RF Match Box: Bias: 13.5 MHz(Bias) & 2 MHz(LF Bias) LF Bias: Daihen RMN-50N1 (p/n : 0190-15322) Source: 60 MHz Daihen AMN-30H (p/n : 0190-15323) Gate valve Nor-Cal / NC-95-PP RF Generator: 13.56 MHz ENI GHW-50A (p/n : 0190-15319) 2 MHz ENI B-5002 (p/n : 0190-15320) 60 MHz AE Ovation 35162 (p/n : 0190-27049) FIB: eFib, wFib (Facilities Interface Box) Chamber Equip Cart: included配置
無配置OEM 代工型號說明
The Centura architecture clusters four processing stations and two auxiliary chambers around a central transfer module containing an ultra-reliable magnetically-coupled vacuum robot. To address advanced low k etch applications, the Applied Centura Enabler Etch system performs etch, strip and clean steps in a single chamber. The Enabler’s all-in-one capability streamlines the process flow for advanced chip designs and significantly reduces operating costs. Enabler Chamber: 300mm only.文檔
無文檔
類別
Dry / Plasma Etch
上次驗證: 超過60天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
109955
晶圓尺寸:
12"/300mm
年份:
2007
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
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APPLIED MATERIALS (AMAT)
CENTURA ENABLER ETCH
類別
Dry / Plasma Etch
上次驗證: 超過60天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
109955
晶圓尺寸:
12"/300mm
年份:
2007
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
描述
Enabler Dielectric etch chamber Turbo pump Shimadzu / TMP-3403LMC (A2) RF Match Box: Bias: 13.5 MHz(Bias) & 2 MHz(LF Bias) LF Bias: Daihen RMN-50N1 (p/n : 0190-15322) Source: 60 MHz Daihen AMN-30H (p/n : 0190-15323) Gate valve Nor-Cal / NC-95-PP RF Generator: 13.56 MHz ENI GHW-50A (p/n : 0190-15319) 2 MHz ENI B-5002 (p/n : 0190-15320) 60 MHz AE Ovation 35162 (p/n : 0190-27049) FIB: eFib, wFib (Facilities Interface Box) Chamber Equip Cart: included配置
無配置OEM 代工型號說明
The Centura architecture clusters four processing stations and two auxiliary chambers around a central transfer module containing an ultra-reliable magnetically-coupled vacuum robot. To address advanced low k etch applications, the Applied Centura Enabler Etch system performs etch, strip and clean steps in a single chamber. The Enabler’s all-in-one capability streamlines the process flow for advanced chip designs and significantly reduces operating costs. Enabler Chamber: 300mm only.文檔
無文檔