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TEL / TOKYO ELECTRON TRIASe+ EX-II TiN
    描述
    Included Components: -EFEM with Three Load Ports -Main Body Part No: TRT-TMZZ -Chamber Part No: TEX-061 (Qty. 4) -Transformer Box: 3M80-001940-13 (Qty. 2) -Power Distribution Part No: MB-G2AAAA
    配置
    TEL Tokyo Electron Triase+ 300mm CVD ASFD TiN Process System Load Ports: 3 Process: ASFD TiN Software: V5.650R1
    OEM 代工型號說明
    The Triase+™ EX-II™ TiN (Titanium Nitride) is an advanced 300mm single wafer deposition system for high speed ASFD which enables high-quality thin film formation with excellent within-wafer uniformity and high step coverage characteristics. Featuring an optimized reactor design with new gas injection module, the system achieves high productivity even in the leading-edge semiconductor device manufacturing, and is used for various applications including formation of contact barriers, capacitor electrodes, word line barriers and metal gates.
    文檔

    無文檔

    TEL / TOKYO ELECTRON

    TRIASe+ EX-II TiN

    verified-listing-icon

    已驗證

    類別
    Deposition

    上次驗證: 超過60天前

    關鍵商品詳情

    條件:

    Used


    作業狀態:

    未知


    產品編號:

    114272


    晶圓尺寸:

    12"/300mm


    年份:

    2017


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    類似上架商品
    查看全部
    TEL / TOKYO ELECTRON TRIASe+ EX-II TiN

    TEL / TOKYO ELECTRON

    TRIASe+ EX-II TiN

    Deposition
    年份: 2017條件: 二手
    上次驗證超過60天前

    TEL / TOKYO ELECTRON

    TRIASe+ EX-II TiN

    verified-listing-icon
    已驗證
    類別
    Deposition
    上次驗證: 超過60天前
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    關鍵商品詳情

    條件:

    Used


    作業狀態:

    未知


    產品編號:

    114272


    晶圓尺寸:

    12"/300mm


    年份:

    2017


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    描述
    Included Components: -EFEM with Three Load Ports -Main Body Part No: TRT-TMZZ -Chamber Part No: TEX-061 (Qty. 4) -Transformer Box: 3M80-001940-13 (Qty. 2) -Power Distribution Part No: MB-G2AAAA
    配置
    TEL Tokyo Electron Triase+ 300mm CVD ASFD TiN Process System Load Ports: 3 Process: ASFD TiN Software: V5.650R1
    OEM 代工型號說明
    The Triase+™ EX-II™ TiN (Titanium Nitride) is an advanced 300mm single wafer deposition system for high speed ASFD which enables high-quality thin film formation with excellent within-wafer uniformity and high step coverage characteristics. Featuring an optimized reactor design with new gas injection module, the system achieves high productivity even in the leading-edge semiconductor device manufacturing, and is used for various applications including formation of contact barriers, capacitor electrodes, word line barriers and metal gates.
    文檔

    無文檔

    類似上架商品
    查看全部
    TEL / TOKYO ELECTRON TRIASe+ EX-II TiN

    TEL / TOKYO ELECTRON

    TRIASe+ EX-II TiN

    Deposition年份: 2017條件: 二手上次驗證:超過60天前
    TEL / TOKYO ELECTRON TRIASe+ EX-II TiN

    TEL / TOKYO ELECTRON

    TRIASe+ EX-II TiN

    Deposition年份: 0條件: 二手上次驗證:超過60天前