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TEL / TOKYO ELECTRON TRIASe+ EX-II TiN
    描述
    無描述
    配置
    Three Port Loader Main Body (MISSING ROBOT) Four Chamber with Heater Power Rack HD include
    OEM 代工型號說明
    The Triase+™ EX-II™ TiN (Titanium Nitride) is an advanced 300mm single wafer deposition system for high speed ASFD which enables high-quality thin film formation with excellent within-wafer uniformity and high step coverage characteristics. Featuring an optimized reactor design with new gas injection module, the system achieves high productivity even in the leading-edge semiconductor device manufacturing, and is used for various applications including formation of contact barriers, capacitor electrodes, word line barriers and metal gates.
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    已驗證

    類別
    Deposition

    上次驗證: 超過30天前

    關鍵商品詳情

    條件:

    Used


    作業狀態:

    未知


    產品編號:

    123107


    晶圓尺寸:

    12"/300mm


    年份:

    2015


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
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    TEL / TOKYO ELECTRON TRIASe+ EX-II TiN

    TEL / TOKYO ELECTRON

    TRIASe+ EX-II TiN

    Deposition
    年份: 2018條件: 二手
    上次驗證超過30天前

    TEL / TOKYO ELECTRON

    TRIASe+ EX-II TiN

    verified-listing-icon
    已驗證
    類別
    Deposition
    上次驗證: 超過30天前
    listing-photo-8a60f5b690384500860f7d1962822921-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/78834/8a60f5b690384500860f7d1962822921/7b38c5c165924e9ca02ae7a439f4f6dd_1b364f357e254d3ea8be86c661b78404_mw.png
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    listing-photo-8a60f5b690384500860f7d1962822921-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/78834/8a60f5b690384500860f7d1962822921/08b9c3a8a83648b59c941479fcebaecf_8b3ad914701b412e9bb29374aaf2ac4445005c_mw.jpeg
    listing-photo-8a60f5b690384500860f7d1962822921-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/78834/8a60f5b690384500860f7d1962822921/22182cc7a171429eb766e5378eb25e3c_b1921a49a1df433abdfaa251fdb23aa0_mw.png
    listing-photo-8a60f5b690384500860f7d1962822921-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/78834/8a60f5b690384500860f7d1962822921/c5d8816bdd3f414394bb1c111b4deb55_8af81899418f439d87420f37e424002b45005c_mw.jpeg
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    listing-photo-8a60f5b690384500860f7d1962822921-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/78834/8a60f5b690384500860f7d1962822921/f8f241d40cb843fe864e3a79a108da85_1d601edcffb24ef88eeb06f8d2bef725_mw.jpeg
    關鍵商品詳情

    條件:

    Used


    作業狀態:

    未知


    產品編號:

    123107


    晶圓尺寸:

    12"/300mm


    年份:

    2015


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    描述
    無描述
    配置
    Three Port Loader Main Body (MISSING ROBOT) Four Chamber with Heater Power Rack HD include
    OEM 代工型號說明
    The Triase+™ EX-II™ TiN (Titanium Nitride) is an advanced 300mm single wafer deposition system for high speed ASFD which enables high-quality thin film formation with excellent within-wafer uniformity and high step coverage characteristics. Featuring an optimized reactor design with new gas injection module, the system achieves high productivity even in the leading-edge semiconductor device manufacturing, and is used for various applications including formation of contact barriers, capacitor electrodes, word line barriers and metal gates.
    文檔

    無文檔

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    查看全部
    TEL / TOKYO ELECTRON TRIASe+ EX-II TiN

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    Deposition年份: 2018條件: 二手上次驗證:超過30天前
    TEL / TOKYO ELECTRON TRIASe+ EX-II TiN

    TEL / TOKYO ELECTRON

    TRIASe+ EX-II TiN

    Deposition年份: 2015條件: 二手上次驗證:超過30天前
    TEL / TOKYO ELECTRON TRIASe+ EX-II TiN

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