描述
無描述配置
KLA-TENCOR SP1 TBI UNPATTERNED SURFACE INSPECTION SYSTEM consisting of: - Model: SP1 TBI - Brooks Single 200/300mm FOUP - Unpatterned Surface Inspection System - Wafer Measurement Module - Triple Beam Illumination (TBI) - Normal Illumination- 0.079 Defect Sensitivity - Oblique Illumination- 0.060 Defect Sensitivity - Includes DB Enhancement Option - Includes GEM/SECS (Comm Port) Option - Includes GEM/SECS (HSMS) Option - Includes XY Coordinates Option - Blower BoxOEM 代工型號說明
The SP1 is an unpatterned surface inspection system that can be configured with KLA-Tencor’s Triple-Beam Illumination™ (TBI) technology for exceptional sensitivity on rough films. This technology adds an oblique illumination beam to the SP1’s standard optical configuration, enhancing its ability to capture and distinguish all variations of pits, including crystal originated pits (COPs), from particles. The TBI option maintains the SP1’s axi-symmetric design and allows the use of Adaptive Collection Optics for superior capture of defects on different substrate surfaces.文檔
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KLA
SP1-TBI
類別
Defect Inspection
上次驗證: 4 天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
138247
晶圓尺寸:
未知
年份:
2009
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
描述
無描述配置
KLA-TENCOR SP1 TBI UNPATTERNED SURFACE INSPECTION SYSTEM consisting of: - Model: SP1 TBI - Brooks Single 200/300mm FOUP - Unpatterned Surface Inspection System - Wafer Measurement Module - Triple Beam Illumination (TBI) - Normal Illumination- 0.079 Defect Sensitivity - Oblique Illumination- 0.060 Defect Sensitivity - Includes DB Enhancement Option - Includes GEM/SECS (Comm Port) Option - Includes GEM/SECS (HSMS) Option - Includes XY Coordinates Option - Blower BoxOEM 代工型號說明
The SP1 is an unpatterned surface inspection system that can be configured with KLA-Tencor’s Triple-Beam Illumination™ (TBI) technology for exceptional sensitivity on rough films. This technology adds an oblique illumination beam to the SP1’s standard optical configuration, enhancing its ability to capture and distinguish all variations of pits, including crystal originated pits (COPs), from particles. The TBI option maintains the SP1’s axi-symmetric design and allows the use of Adaptive Collection Optics for superior capture of defects on different substrate surfaces.文檔
無文檔