KLA inhabits two worlds: one that’s nanometers in scale and one that’s global. This micro and macro view gives us a unique perspective. We see electrons wave and industries transform. When you put deep science together with optimism, big things happen.

Our process-control and process-enabling solutions are designed to boost the innovation speed of the electronics industry. We help our customers achieve leading-edge performance.

The Puma 9130 is a Laser Imaging Patterned Wafer Inspection System that combines UV illumination optics with multiple high-speed imaging sensors to offer a range of optical modes for critical defect detection inline on patterned, production wafers1. It delivers high sampling rates, high throughput, and high sensitivity enabling more effective capture and control of yield-impacting defects on critical front-end-of-line (FEOL) and back-end-of-line (BEOL) layers1. The Puma 9130 provides oblique UV illumination while the 9150 also offers an additional, normal illumination mode. Both tools provide three illumination polarizations (S, P, C) and independently configured collection polarization filters (S, P, None) for each of the three channels.

PUMA 9130

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KLA

PUMA 9130

Defect Inspection

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KLA

PUMA 9130

KLA

PUMA 9130

KLA

PUMA 9130

KLA

PUMA 9130

KLA

PUMA 9130

KLA

PUMA 9130

PUMA 9130

Defect Inspection

類似上架商品

KLA

PUMA 9130

KLA

PUMA 9130

KLA

PUMA 9130

KLA

PUMA 9130

KLA

PUMA 9130

KLA

PUMA 9130