概述

The Puma 9130 is a Laser Imaging Patterned Wafer Inspection System that combines UV illumination optics with multiple high-speed imaging sensors to offer a range of optical modes for critical defect detection inline on patterned, production wafers1. It delivers high sampling rates, high throughput, and high sensitivity enabling more effective capture and control of yield-impacting defects on critical front-end-of-line (FEOL) and back-end-of-line (BEOL) layers1. The Puma 9130 provides oblique UV illumination while the 9150 also offers an additional, normal illumination mode. Both tools provide three illumination polarizations (S, P, C) and independently configured collection polarization filters (S, P, None) for each of the three channels.