描述
Thickness measurement配置
無配置OEM 代工型號說明
The SpectraFx 200 is a thin-film measurement system that uses spectroscopic ellipsometry technology to non-destructively measure process variation on product wafers. It is optimized for 300mm fab-to-fab and tool-to-tool matching and provides enhanced performance on ultra-thin gate oxides, multi-stack, and 193-nm anti-reflective coating layers. It also has a 2D film stress option that measures the entire wafer to generate a 2D wafer map.文檔
無文檔
類別
Defect Inspection
上次驗證: 超過60天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
129566
晶圓尺寸:
12"/300mm
年份:
2005
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
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KLA
SPECTRAFX 200
類別
Defect Inspection
上次驗證: 超過60天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
129566
晶圓尺寸:
12"/300mm
年份:
2005
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
描述
Thickness measurement配置
無配置OEM 代工型號說明
The SpectraFx 200 is a thin-film measurement system that uses spectroscopic ellipsometry technology to non-destructively measure process variation on product wafers. It is optimized for 300mm fab-to-fab and tool-to-tool matching and provides enhanced performance on ultra-thin gate oxides, multi-stack, and 193-nm anti-reflective coating layers. It also has a 2D film stress option that measures the entire wafer to generate a 2D wafer map.文檔
無文檔