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KLA SPECTRAFX 200
    描述
    無描述
    配置
    Film Thickness Measurement
    OEM 代工型號說明
    The SpectraFx 200 is a thin-film measurement system that uses spectroscopic ellipsometry technology to non-destructively measure process variation on product wafers. It is optimized for 300mm fab-to-fab and tool-to-tool matching and provides enhanced performance on ultra-thin gate oxides, multi-stack, and 193-nm anti-reflective coating layers. It also has a 2D film stress option that measures the entire wafer to generate a 2D wafer map.
    文檔

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    類別
    Defect Inspection

    上次驗證: 超過60天前

    關鍵商品詳情

    條件:

    Used


    作業狀態:

    未知


    產品編號:

    107338


    晶圓尺寸:

    12"/300mm


    年份:

    2006


    Logistics Support
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available

    KLA

    SPECTRAFX 200

    verified-listing-icon
    已驗證
    類別
    Defect Inspection
    上次驗證: 超過60天前
    listing-photo-71ce4bcfc63a4d368ac9100bc9fc8cf5-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
    關鍵商品詳情

    條件:

    Used


    作業狀態:

    未知


    產品編號:

    107338


    晶圓尺寸:

    12"/300mm


    年份:

    2006


    Logistics Support
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    描述
    無描述
    配置
    Film Thickness Measurement
    OEM 代工型號說明
    The SpectraFx 200 is a thin-film measurement system that uses spectroscopic ellipsometry technology to non-destructively measure process variation on product wafers. It is optimized for 300mm fab-to-fab and tool-to-tool matching and provides enhanced performance on ultra-thin gate oxides, multi-stack, and 193-nm anti-reflective coating layers. It also has a 2D film stress option that measures the entire wafer to generate a 2D wafer map.
    文檔

    無文檔