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KLA SPECTRAFX 200
  • KLA SPECTRAFX 200
  • KLA SPECTRAFX 200
  • KLA SPECTRAFX 200
描述
無描述
配置
Film Thickness Measurement
OEM 代工型號說明
The SpectraFx 200 is a thin-film measurement system that uses spectroscopic ellipsometry technology to non-destructively measure process variation on product wafers. It is optimized for 300mm fab-to-fab and tool-to-tool matching and provides enhanced performance on ultra-thin gate oxides, multi-stack, and 193-nm anti-reflective coating layers. It also has a 2D film stress option that measures the entire wafer to generate a 2D wafer map.
文檔

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類別
Defect Inspection

上次驗證: 超過60天前

關鍵商品詳情

條件:

Used


作業狀態:

未知


產品編號:

107338


晶圓尺寸:

12"/300mm


年份:

2006


Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available

KLA

SPECTRAFX 200

verified-listing-icon
已驗證
類別
Defect Inspection
上次驗證: 超過60天前
listing-photo-71ce4bcfc63a4d368ac9100bc9fc8cf5-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
關鍵商品詳情

條件:

Used


作業狀態:

未知


產品編號:

107338


晶圓尺寸:

12"/300mm


年份:

2006


Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
描述
無描述
配置
Film Thickness Measurement
OEM 代工型號說明
The SpectraFx 200 is a thin-film measurement system that uses spectroscopic ellipsometry technology to non-destructively measure process variation on product wafers. It is optimized for 300mm fab-to-fab and tool-to-tool matching and provides enhanced performance on ultra-thin gate oxides, multi-stack, and 193-nm anti-reflective coating layers. It also has a 2D film stress option that measures the entire wafer to generate a 2D wafer map.
文檔

無文檔