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6" Fab For Sale from Moov - Click Here to Learn More
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KLA CANDELA CS20
    描述
    無描述
    配置
    無配置
    OEM 代工型號說明
    The Candela CS20 system measures surface reflectivity and topography for automatic defect detection and classification. It uses scatterometry, ellipsometry, reflectometry, and topographical analysis to inspect wafer surfaces for defects and film thickness uniformity. It is designed for inspection of transparent materials such as sapphire and GaN and can detect a wide variety of defects. It is suitable for use in the production of High Brightness Light Emitting Diodes (HBLEDs), High-Power RF Devices, and Coated Glass (CMOS imagers, LCoS chips, etc.).
    文檔

    無文檔

    KLA

    CANDELA CS20

    verified-listing-icon

    已驗證

    類別
    Defect Inspection

    上次驗證: 超過60天前

    關鍵商品詳情

    條件:

    Refurbished


    作業狀態:

    未知


    產品編號:

    85052


    晶圓尺寸:

    未知


    年份:

    未知


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    類似上架商品
    查看全部
    KLA CANDELA CS20

    KLA

    CANDELA CS20

    Defect Inspection
    年份: 2006條件: 二手
    上次驗證超過30天前

    KLA

    CANDELA CS20

    verified-listing-icon
    已驗證
    類別
    Defect Inspection
    上次驗證: 超過60天前
    listing-photo-37affdd90b204b51ac7340f14665a833-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
    關鍵商品詳情

    條件:

    Refurbished


    作業狀態:

    未知


    產品編號:

    85052


    晶圓尺寸:

    未知


    年份:

    未知


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    描述
    無描述
    配置
    無配置
    OEM 代工型號說明
    The Candela CS20 system measures surface reflectivity and topography for automatic defect detection and classification. It uses scatterometry, ellipsometry, reflectometry, and topographical analysis to inspect wafer surfaces for defects and film thickness uniformity. It is designed for inspection of transparent materials such as sapphire and GaN and can detect a wide variety of defects. It is suitable for use in the production of High Brightness Light Emitting Diodes (HBLEDs), High-Power RF Devices, and Coated Glass (CMOS imagers, LCoS chips, etc.).
    文檔

    無文檔

    類似上架商品
    查看全部
    KLA CANDELA CS20

    KLA

    CANDELA CS20

    Defect Inspection年份: 2006條件: 二手上次驗證:超過30天前
    KLA CANDELA CS20

    KLA

    CANDELA CS20

    Defect Inspection年份: 2006條件: 二手上次驗證:超過30天前
    KLA CANDELA CS20

    KLA

    CANDELA CS20

    Defect Inspection年份: 2006條件: 二手上次驗證:超過60天前