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AVIZA / WATKINS-JOHNSON WJ-1500
  • AVIZA / WATKINS-JOHNSON WJ-1500
  • AVIZA / WATKINS-JOHNSON WJ-1500
  • AVIZA / WATKINS-JOHNSON WJ-1500
描述
無描述
配置
Bulk list of parts for WJ WJ1500 LIST ATTACHED
OEM 代工型號說明
WJ 1500 APCVD system processes 200mm wafers addressing design-rule fabrication capability of 0.15 micron. It offers relatively low cost of ownership with a process designed to result in improved reliability, performance and serviceability through enhanced film uniformity, reduced consumables, improved system availability and ultra-low film metal levels. Our 1500 APCVD system provides both doped and un-doped deposition of tetraethylorthosilicate- , or TEOS- , based silicon dioxide and can be utilized in a broad range of dielectric film applications for both logic and memory manufacturing requirements.
文檔
類別
CVD

上次驗證: 超過60天前

關鍵商品詳情

條件:

Parts Tool


作業狀態:

未知


產品編號:

82670


晶圓尺寸:

未知


年份:

未知


Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available

AVIZA / WATKINS-JOHNSON

WJ-1500

verified-listing-icon
已驗證
類別
CVD
上次驗證: 超過60天前
listing-photo-e79e5d476fbb402289096c9b2dc1ee7b-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
關鍵商品詳情

條件:

Parts Tool


作業狀態:

未知


產品編號:

82670


晶圓尺寸:

未知


年份:

未知


Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
描述
無描述
配置
Bulk list of parts for WJ WJ1500 LIST ATTACHED
OEM 代工型號說明
WJ 1500 APCVD system processes 200mm wafers addressing design-rule fabrication capability of 0.15 micron. It offers relatively low cost of ownership with a process designed to result in improved reliability, performance and serviceability through enhanced film uniformity, reduced consumables, improved system availability and ultra-low film metal levels. Our 1500 APCVD system provides both doped and un-doped deposition of tetraethylorthosilicate- , or TEOS- , based silicon dioxide and can be utilized in a broad range of dielectric film applications for both logic and memory manufacturing requirements.
文檔