描述
APCVD Atmospheric Pressure Chemical Vapor Deposition配置
無配置OEM 代工型號說明
The AMS 2100, a self-contained CVD system for volume production ofSiO 2 , PSG or BPSG films. Continuous processing provides high throughput rates; the optimum deposition rate of 1,100 A/minute provides low-stress films with guaranteed uniformities.文檔
無文檔
APPLIED MATERIALS (AMAT)
AMS 2100
已驗證
類別
CVD
上次驗證: 27 天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
115776
晶圓尺寸:
未知
年份:
未知
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
APPLIED MATERIALS (AMAT)
AMS 2100
類別
CVD
上次驗證: 27 天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
115776
晶圓尺寸:
未知
年份:
未知
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
描述
APCVD Atmospheric Pressure Chemical Vapor Deposition配置
無配置OEM 代工型號說明
The AMS 2100, a self-contained CVD system for volume production ofSiO 2 , PSG or BPSG films. Continuous processing provides high throughput rates; the optimum deposition rate of 1,100 A/minute provides low-stress films with guaranteed uniformities.文檔
無文檔