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APPLIED MATERIALS (AMAT) AMS 2100
  • APPLIED MATERIALS (AMAT) AMS 2100
  • APPLIED MATERIALS (AMAT) AMS 2100
  • APPLIED MATERIALS (AMAT) AMS 2100
描述
APCVD Atmospheric Pressure Chemical Vapor Deposition
配置
無配置
OEM 代工型號說明
The AMS 2100, a self-contained CVD system for volume production ofSiO 2 , PSG or BPSG films. Continuous processing provides high throughput rates; the optimum deposition rate of 1,100 A/minute provides low-stress films with guaranteed uniformities.
文檔

無文檔

類別
CVD

上次驗證: 超過60天前

關鍵商品詳情

條件:

Used


作業狀態:

未知


產品編號:

115776


晶圓尺寸:

未知


年份:

未知


Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available

APPLIED MATERIALS (AMAT)

AMS 2100

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已驗證
類別
CVD
上次驗證: 超過60天前
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關鍵商品詳情

條件:

Used


作業狀態:

未知


產品編號:

115776


晶圓尺寸:

未知


年份:

未知


Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
描述
APCVD Atmospheric Pressure Chemical Vapor Deposition
配置
無配置
OEM 代工型號說明
The AMS 2100, a self-contained CVD system for volume production ofSiO 2 , PSG or BPSG films. Continuous processing provides high throughput rates; the optimum deposition rate of 1,100 A/minute provides low-stress films with guaranteed uniformities.
文檔

無文檔