描述
2 develop cups, 1 coat cup, 4 chill hot plates, 3 chill plates, 3 low temp hot plates, WEE Right, 1C, 2D, 1WEE, 3HP, 4 CHP, 3 COL Main Frame: Dual Block配置
2 develop, 1 coat, 3 chill hot plates, 4 low temp hot plates, 1 high temp hot plate, WEE Main Frame: Single BlockOEM 代工型號說明
The CLEAN TRACK™ Mark 7/8 is an innovative coater developer system designed for 5 to 8 inch wafers. It builds upon the success of the Mark V, which was released in 1989 as a top-end model, by incorporating further scaling and improved productivity. The Mark 7/8 also features advanced environment control technology, which enables stable and excellent performance. This system is versatile and can support various manufacturing scenarios, from research and development to volume production.文檔
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TEL / TOKYO ELECTRON
MARK 8
已驗證
類別
Coaters & Developers
上次驗證: 超過30天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
105226
晶圓尺寸:
8"/200mm
年份:
1998
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
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TEL / TOKYO ELECTRON
MARK 8
類別
Coaters & Developers
上次驗證: 超過30天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
105226
晶圓尺寸:
8"/200mm
年份:
1998
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
描述
2 develop cups, 1 coat cup, 4 chill hot plates, 3 chill plates, 3 low temp hot plates, WEE Right, 1C, 2D, 1WEE, 3HP, 4 CHP, 3 COL Main Frame: Dual Block配置
2 develop, 1 coat, 3 chill hot plates, 4 low temp hot plates, 1 high temp hot plate, WEE Main Frame: Single BlockOEM 代工型號說明
The CLEAN TRACK™ Mark 7/8 is an innovative coater developer system designed for 5 to 8 inch wafers. It builds upon the success of the Mark V, which was released in 1989 as a top-end model, by incorporating further scaling and improved productivity. The Mark 7/8 also features advanced environment control technology, which enables stable and excellent performance. This system is versatile and can support various manufacturing scenarios, from research and development to volume production.文檔
無文檔