描述
2 develop cups, 1 coat cup, 4 chill hot plates, 3 chill plates, 3 low temp hot plates, WEE Right, 1C, 2D, 1WEE, 3HP, 4 CHP, 3 COL Main Frame: Dual Block配置
2 develop, 1 coat, 3 chill hot plates, 4 low temp hot plates, 1 high temp hot plate, WEE Main Frame: Single BlockOEM 代工型號說明
The CLEAN TRACK™ Mark 7/8 is an innovative coater developer system designed for 5 to 8 inch wafers. It builds upon the success of the Mark V, which was released in 1989 as a top-end model, by incorporating further scaling and improved productivity. The Mark 7/8 also features advanced environment control technology, which enables stable and excellent performance. This system is versatile and can support various manufacturing scenarios, from research and development to volume production.文檔
無文檔
TEL / TOKYO ELECTRON
MARK 8
已驗證
類別
Coaters & Developers
上次驗證: 超過60天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
105226
晶圓尺寸:
8"/200mm
年份:
1998
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
類似上架商品
查看全部
TEL / TOKYO ELECTRON
MARK 8
類別
Coaters & Developers
上次驗證: 超過60天前
關鍵商品詳情
條件:
Used
作業狀態:
未知
產品編號:
105226
晶圓尺寸:
8"/200mm
年份:
1998
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
描述
2 develop cups, 1 coat cup, 4 chill hot plates, 3 chill plates, 3 low temp hot plates, WEE Right, 1C, 2D, 1WEE, 3HP, 4 CHP, 3 COL Main Frame: Dual Block配置
2 develop, 1 coat, 3 chill hot plates, 4 low temp hot plates, 1 high temp hot plate, WEE Main Frame: Single BlockOEM 代工型號說明
The CLEAN TRACK™ Mark 7/8 is an innovative coater developer system designed for 5 to 8 inch wafers. It builds upon the success of the Mark V, which was released in 1989 as a top-end model, by incorporating further scaling and improved productivity. The Mark 7/8 also features advanced environment control technology, which enables stable and excellent performance. This system is versatile and can support various manufacturing scenarios, from research and development to volume production.文檔
無文檔